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US 9,318,440 B2Granted
Formation of carbon-rich contact liner material
AssigneeGlobalfoundries Inc.
InventorsHuy Cao, Songkram Srivathanakul, Huang Liu, Garo Jacques Derderian, Boaz Alperson
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Abstract
Conductive contact structure of a circuit structures and methods of fabrication thereof are provided. The fabrication includes, for instance, providing at least one contact opening disposed over a semiconductor substrate; forming a carbon-rich contact liner material having a set carbon content conformally within the at least one contact opening disposed over the semiconductor substrate.
Claims20
A method comprising:
- fabricating a conductive contact structure, the fabricating comprising:
- providing at least one contact opening disposed over a semiconductor substrate;
- and
- creating a conformal carbon-rich contact liner material having a set carbon content therein within the at least one contact opening disposed over the semiconductor substrate.
1 more element
A device comprising:
- a conductive contact structure of a circuit structure, the conductive contact structure comprising:
- at least one contact opening disposed over a semiconductor substrate;
- and
- a carbon-rich contact liner material formed conformally within the at least one contact opening, the carbon-rich contact liner material having a set carbon content therein.
1 more element
Dependencies are inferred from the claim text.