Stacked semiconductor chips including test circuitry
AssigneeHitachi, Ltd.
InventorsMasanao Yamaoka, Kenichi Osada
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AssigneeHitachi, Ltd.
InventorsMasanao Yamaoka, Kenichi Osada
Estimating the term…
A semiconductor device includes: a first circuit block formed on a first semiconductor substrate having first and second sides extending in a first direction and third and fourth sides extending in a second direction intersecting with the first direction; a plurality of signal-line through vias that are connected to the first semiconductor substrate and transmit signals, which are output from the first circuit block, to a second circuit block formed on another second semiconductor substrate; and a plurality of power-supply through vias for supplying power to the first circuit block, and in the semiconductor device, the plurality of power-supply through vias are formed at edges of the first semiconductor substrate along the third and fourth sides and are formed in a plurality of rows in the first direction. Each circuit block has a power consuming mode in which power larger than the power consumption in a normal mode is consumed.
A semiconductor device comprising:
Dependencies are inferred from the claim text.
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Testing or measuring during manufacture or treatment of wafers, substrates or devices: structural arrangements therefor
Characterised by their conductive parts: power or ground buses
Package configurations
Interconnections or connectors in packages
About 6 years 3 months of term left · ends 4 Feb 2033 (estimated)
The present invention relates to a semiconductor device in which a plurality of semiconductor integrated circuits are three-dimensionally integrated by using through silicon vias (TSV).
Recently, in a semiconductor integrated circuit (LSI: Large Scale Integrated Circuit), the amount of the circuits integrated in one chip has been increased and the performance of the circuits has also been improved along with the further miniaturization in the semiconductor manufacturing processes. However, when chips are sealed in a package and the package is mounted on a board, communication performance is degraded due to the long communication distance between the chips, and the communication performance cannot catch up with the performance improvement in the chips. Moreover, due to the influence of, for example, miniaturization limit and increase in the cost to use most-advanced processes, the conventional performance improvement by the integration onto one chip will not always be the most optimum solution in the future.
As a technique for improving the performance between chips, Patent Document 1 discloses the technique of three-dimensionally stacking a plurality of chips and connecting the respective chips by using through silicon vias to carry out inter-chip communication. Also, Patent Document 2 introduces the technique of finding out short-circuit fault of through electrodes used for signals.
FIG. 1 is a schematic drawing of the disposition of TSVs of the stacked LSIs to which the present invention is applied;
FIG. 2 is a cross-sectional view of the stacked LSIs to which the present invention is applied;
FIG. 3 is a schematic drawing of the disposition of TSVs and circuits of the stacked LSIs to which the present invention is applied;
FIG. 1 shows a schematic drawing of the disposition of through silicon vias (TSVs) of three-dimensionally stacked LSIs using the present invention. In FIG. 1, black circles represent power-supply TSVs for supplying power to stacked chips, and white circles represent signal-line TSVs which transmit signals between the stacked chips. The power-supply TSVs are disposed in a plurality of rows in an outer peripheral part of the chips, and the signal-line TSVs are disposed inside them. FIG. 2 shows the cross-sectional structure in which two CPU chips on which a plurality of CPUs (Central Processing Units) are mounted and two memory chips on which memory arrays are mounted are stacked by using this TSV disposing configuration. FIG. 2 is the cross section of the chips of FIG. 1 taken along the line A-A′. The power-supply TSVs and the signal-line TSVs connecting the respective chips are disposed at the same locations in the vertical direction. Each of the chips is stacked so that a metal wiring layer is directed downward, and the TSVs are connected to a metal wiring layer of the chip stacked thereabove, penetrate through a silicon layer of the chip stacked therebelow, and are connected to a metal wiring layer of the chip stacked therebelow. FIG. 7 shows this state. Here, the lowermost chip is connected to a package substrate. In this case, the metal wiring layer of the lowermost chip is directed downward in order to shorten the distance of the signal lines between the chip and the package substrate, and the metal wiring layers of all the stacked chips are directed downward in conformity to it.
FIG. 3 shows an example of the disposition of TSVs and the disposition of CPUs in the CPU chip using the present invention. In this LSI chip, eight CPU cores CPU 1 to 8 are integrated. The TSVs for power supply and signal lines are disposed in the peripheral part of the chip, and the CPUs are disposed at a center part of the chip. In this manner, circuit blocks such as CPUs are disposed in the region in which the TSVs are not located.
FIG. 4 shows an example of the disposition of TSVs and the disposition of memories in the memory chip using the present invention. The TSVs for power supply and signal lines are disposed in the peripheral part of the chip, and a RAM 1 and a RAM 2 serving as memory arrays are disposed at a center part of the chip. In this manner, circuit blocks such as memories are disposed in the region in which the TSVs are not located.