Plasma chamber top piece assembly
AssigneeLam Research Corporation
InventorsLeonard J. Sharpless, Keith Comendant
Life of this patent
Estimating the term…
Abstract
A plasma processing system for processing a substrate is described. The plasma processing system includes a bottom piece including a chuck configured for holding the substrate. The plasma processing system also includes an induction coil configured to generate an electromagnetic field in order to create a plasma for processing the substrate; and an optimized top piece coupled to the bottom piece, the top piece further configured for a heating and cooling system. Wherein, the heating and cooling system is substantially shielded from the electromagnetic field by the optimized top piece, and the optimized top piece can substantially be handled by a single person.
Claims17
A top piece for a plasma processing chamber, comprising:
- a first shelf;
- a second shelf;
- a wall disposed between the first shelf and the second shelf;
- and
- a cavity, that has at least one side that is open to the plasma processing chamber, being formed between the first shelf and the second shelf and between the wall, wherein the cavity comprises a configuration to accommodate a heating and cooling system for the plasma processing chamber with the top piece providing RF shielding to shield RF from the heating and cooling system;
- wherein the first shelf is above the second shelf, and wherein a top cover of the plasma processing chamber is aligned by the first shelf and resting on the second shelf.
A top piece for a plasma processing chamber, comprising:
- a first shelf;
- a second shelf;
- a wall disposed between the first shelf and the second shelf;
- and
- a cavity formed between the first shelf, the second shelf and between the wall, wherein the cavity is configured to accommodate a heating and cooling system disposed in the cavity with the top piece shielding the heating and cooling system from RF of the plasma processing chamber;
- wherein the first shelf is above the second shelf, and wherein a top cover of the plasma processing chamber is aligned by the first shelf and resting on the second shelf.
Dependencies are inferred from the claim text.