Back to results
US 9,318,234 B2Granted
Insulating film and producing method for insulating film
AssigneeSamsung Electro-Mechanics Co., Ltd.
InventorsChung Hee Lee, Jae Choon Cho, Jong Yoon Jang, Hee Sun Chun, Jong Su Park, Sung Hyun Kim
Life of this patent
Estimating the term…
Abstract
Disclosed herein are an insulating film and a producing method of the insulating film which can address problems caused by dents by providing a reinforcing layer having the weight ratio of the silica of 60 to 80 wt % on one surface of the insulating film.
Claims3
An insulating film, comprising:
- an insulating layer including an insulating resin and silica,
- wherein a weight ratio of the silica is 50 wt % or less of the insulating layer;
- a reinforcing layer of one surface of which is in contact with one surface of the insulating layer and including an insulating resin and silica,
- wherein a weight ratio of the silica is between 60 and 80 wt % of the reinforcing layer;
- a PET (polyethylene terephthalate) film layer provided on the other surface of the reinforcing layer;
- and
- a BOPP (biaxially oriented polypropylene) film layer provided on the other surface of the insulating layer.
4 more elements
Dependencies are inferred from the claim text.