Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder

A lithographic apparatus, comprising:

• a projection system arranged to project a beam patterned by a patterning device onto a substrate;
• and
• a substrate holder arranged to hold the substrate, the substrate holder comprising:
• a main body having a surface, the surface having a surface roughness;
• a plurality of burls projecting from the surface and having end surfaces to support a substrate;
• a planarization layer provided on at least part of the surface of the main body, the planarization layer at least partially filling in the surface roughness and having an outer surface having a peak to valley distance of less than about 10 μm;
• and
• a thin film stack provided on the outer surface of the planarization layer and forming an electrical or electronic component.

A device manufacturing method using a lithographic apparatus, the method comprising:

• projecting a beam patterned by a patterning device onto a substrate while holding the substrate in a substrate holder,
• wherein the substrate holder comprises;
• a main body having a surface, the surface having a surface roughness;
• a plurality of burls projecting from the surface and having end surfaces to support a substrate;
• a planarization layer provided on at least part of the surface of the main body, the planarization layer at least partially filling in the surface roughness and having an outer surface having a peak to valley distance of less than about 10 μm;
• and
• a thin film stack provided on the outer surface of the planarization layer and forming an electrical or electronic component.

A substrate holder for use in a lithographic apparatus, the substrate holder comprising:

• a main body having a surface, the surface having a surface roughness;
• a plurality of burls projecting from the surface and having end surfaces to support a substrate;
• a planarization layer provided on at least part of the surface of the main body, the planarization layer at least partially filling in the surface roughness and having a substantially uniform thickness with an essentially flat outer surface;
• and
• a thin film stack provided on the outer surface of the planarization layer and forming an electrical or electronic component.

A method of manufacturing a substrate holder for use in a lithographic apparatus, the method comprising:

• providing a main body having a surface and a plurality of burls projecting from the surface and having end surfaces to support a substrate, the surface of the main body having a surface roughness;
• forming a planarization layer on at least part of the surface of the main body, the planarization layer at least partially filling in the surface roughness and the planarization layer having an outer surface having a peak to valley distance of less than about 10 μm;
• and
• forming a thin film stack on the outer surface of the planarization layer, the thin film stack forming an electrical or electronic component.