Measuring method, stage apparatus, and exposure apparatus

A liquid immersion exposure apparatus that exposes a substrate with an exposure light via a projection optical system and a liquid, the apparatus comprising:

• a frame structure having a metrology frame configured to support the projection optical system;
• a mark detecting system supported by the metrology frame apart from the projection optical system and configured to detect a mark of the substrate;
• a base member arranged below the projection optical system and the mark detecting system;
• a stage that is arranged on the base and is movable relative to the projection optical system and the mark detecting system, the stage having a holder configured to support the substrate and having a projection member configured to project outwardly from the stage;
• a liquid immersion system that has a nozzle unit configured to surround an optical element of the projection optical system, the optical element being contactable with the liquid, the stage being located opposite to a lower surface of the nozzle unit, the nozzle unit having a recovery port that recovers the liquid at a lower side surface of the nozzle unit;
• a plurality of grating members supported by the metrology frame such that the stage is movable below the plurality of grating members;
• a head member that is disposed on the projection member, the head member irradiating a beam to the grating member;
• and
• a plurality of flexible members that are arranged between the metrology frame and the plurality of grating members and permit the plurality of grating members to move in a direction perpendicular to an optical axis of the projection optical system,
• wherein positional information of the stage is measured by the head member during both of an exposure operation of the substrate and a detection operation of the mark by the mark detecting system.

A liquid immersion exposure apparatus that exposes a substrate with an exposure light via a projection optical system and a liquid, the apparatus comprising:

• a frame structure having a metrology frame configured to support the projection optical system;
• a mark detecting system supported by the metrology frame apart from the projection optical system and configured to detect a mark of the substrate;
• a base member arranged below the projection optical system and the mark detecting system;
• a stage that is arranged on the base and is movable relative to the projection optical system and the mark detecting system, the stage having a holder configured to support the substrate and having a top surface that is positionable below the projection optical system by movement of the stage;
• a liquid immersion system that has a nozzle unit configured to surround an optical element of the projection optical system, the optical element being contactable with the liquid, the stage being located opposite to a lower surface of the nozzle unit, the nozzle unit having a recovery port that recovers the liquid at a lower side surface of the nozzle unit;
• a grating member supported by the metrology frame such that the stage is movable below the grating member;
• and
• a head member that is attached to the stage, the head member being disposed separate from the top surface of the stage and irradiating a beam to the grating member,
• wherein positional information of the stage is measured by the head member during both of an exposure operation of the substrate and a detection operation of the mark by the mark detecting system.

A liquid immersion exposure apparatus that exposes a substrate with an exposure light via a projection optical system and a liquid, the apparatus comprising:

• a frame structure having a metrology frame configured to support the projection optical system;
• a mark detecting system supported by the metrology frame apart from the projection optical system and configured to detect a mark of the substrate;
• a base member arranged below the projection optical system and the mark detecting system;
• a stage that is arranged on the base and is movable relative to the projection optical system and the mark detecting system, the stage having a holder configured to support the substrate and having a top surface that is positionable below the projection optical system by movement of the stage;
• a liquid immersion system that has a nozzle unit configured to surround an optical element of the projection optical system, the optical element being contactable with the liquid, the stage being located opposite to a lower surface of the nozzle unit, the nozzle unit having a recovery port that recovers the liquid at a lower side surface of the nozzle unit;
• a plurality of grating members supported by the metrology frame such that the stage is movable below the plurality of grating members;
• a head member that is attached to the stage, the head member being disposed separate from the top surface of the stage and irradiating a beam to the grating member;
• and
• a plurality of flexible members that are arranged between the metrology frame and the plurality of grating members and permit the plurality of grating members to move in a direction perpendicular to an optical axis of the projection optical system,
• wherein positional information of the stage is measured by the head member during both of an exposure operation of the substrate and a detection operation of the mark by the mark detecting system.