Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation method
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsMasatoshi Echigo, Go Higashihara, Naoya Uchiyama
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Abstract
Material for forming an underlayer film for lithography, which has a high carbon concentration, a low oxygen concentration, a relatively high heat resistance and also a relatively high solvent solubility, and which can be applied to a wet process is disclosed. Material for forming an underlayer film for lithography contains a compound represented by general formula (1).
Claims9
A material for forming an underlayer film for lithography, comprising:
- a compound represented by the following general formula (1)
- wherein formula (1), each X independently represents an oxygen atom or a sulfur atom, each R1 independently represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom, or an aromatic group having 6 to 30 carbon atoms, and each R2 independently represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, provided that at least one R2 represents a hydroxyl group, each m is independently an integer of 1 to 6, and n is an integer of 1 to 4;
- and
- at least one of an acid generating agent and a crosslinking agent.
A material for forming an underlayer film for lithography, comprising a resin having a structure represented by the following general formula (2)
- wherein formula (2), each X independently represents an oxygen atom or a sulfur atom, each R1 independently represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom, or an aromatic group having 6 to 30 carbon atoms, and each R2 independently represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, provided that at least one R2 represents a hydroxyl group, each R3 independently represents a single bond, or a linear or branched alkylene group having 1 to 20 carbon atoms, each m2 is independently an integer of 1 to 5, and n is an integer of 1 to 4.
Dependencies are inferred from the claim text.