Back to results
US 9,316,908 B2Granted
Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, photomask blank and method of forming pattern
AssigneeFUJIFILM Corporation
InventorKoutarou Takahashi
Life of this patent
Estimating the term…
Abstract
Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a resin that when acted on by an acid, is decomposed to thereby increase its alkali solubility, which resin comprises at least either any of repeating units (I) of general formula (I) below or any of repeating units (II) of general formula (II) below, (B) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume ranges from 250 Å3 to less than 350 Å3, and (C) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume is 400 Å3 or greater.
Claims18
An actinic-ray- or radiation-sensitive resin composition comprising:
- (A) a resin that when acted on by an acid, is decomposed to thereby increase its alkali solubility, which resin comprises both of any of repeating units (I) of general formula (I) below and any of repeating units (III) of general formula (III) below,
- (B) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume ranges from 250 Å3 to less than 350 Å3, and
- (C) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume is 400 Å3 or greater,
- in which
- in general formula (I), R1 represents a hydrogen atom or a methyl group;
- L1 represents a single bond or a bivalent connecting group;
- Ar1 represents an aromatic connecting group;
- X1 represents a group leaving when acted on by an acid;
- and m is an integer of 1 to 3, and
- in general formula (III), R3 represents a hydrogen atom or a methyl group;
- L3 represents a single bond or a bivalent connecting group;
- Ar3 represents an aromatic connecting group;
- and n is an integer of 1 to 3,
- wherein the acid generators (B) and (C) are simultaneously acid generators that when exposed to actinic rays or radiation, generate an optionally substituted benzenesulfonic acid.
11 more elements
An actinic-ray- or radiation-sensitive resin composition comprising:
- (A) a resin that when acted on by an acid, is decomposed to thereby increase its alkali solubility, which resin comprises both of any of repeating units (I) of general formula (I) below and any of repeating units (III) of general formula (III) below,
- (B) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume ranges from 250 Å3 to less than 350 Å3, and
- (C) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume is 400 Å3 or greater,
- in which
- in general formula (I), R1 represents a hydrogen atom or a methyl group;
- L1 represents a single bond or a bivalent connecting group;
- Ar1 represents an aromatic connecting group;
- X1 represents a group leaving when acted on by an acid;
- and m is an integer of 1 to 3, and in general formula (III), R3 represents a hydrogen atom or a methyl group;
- L3 represents a single bond or a bivalent connecting group;
- Ar3 represents an aromatic connecting group;
- and n is an integer of 1 to 3,
- wherein the volume of the sulfonic acid generated by the acid generator (C) is in the range of 400 to 470 Å3.
10 more elements
An actinic-ray- or radiation-sensitive resin composition comprising:
- (A) a resin that when acted on by an acid, is decomposed to thereby increase its alkali solubility, which resin comprises both of any of repeating units (I) of general formula (I) below and any of repeating units (III) of general formula (III) below,
- (B) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume ranges from 250 Å3 to less than 350 Å3, and
- (C) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume is 400 Å3 or greater,
- in which
- in general formula (I), R1 represents a hydrogen atom or a methyl group;
- L1 represents a single bond or a bivalent connecting group;
- Ar1 represents an aromatic connecting group;
- X1 represents a group leaving when acted on by an acid;
- and m is an integer of 1 to 3, and
- in general formula (III), R3 represents a hydrogen atom or a methyl group;
- L3 represents a single bond or a bivalent connecting group;
- Ar3 represents an aromatic connecting group;
- and n is an integer of 1 to 3,
- wherein an average value of generated acid volumes is in the range of 350 to 405 Å3, wherein an average value of generated acid volumes refers to the sum of [volume (Å3) of an acid generated by each acid generator]×[mass ratio of the acid generator based on the total mass of acid generators].
11 more elements
An actinic-ray- or radiation-sensitive resin composition comprising:
- (A) a resin that when acted on by an acid, is decomposed to thereby increase its alkali solubility, which resin comprises both of any of repeating units (I) of general formula (I) below and any of repeating units (III) of general formula (III) below,
- (B) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume ranges from 250 Å3 to less than 350 Å3, and
- (C) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume is 400 Å3 or greater,
- in which
- in general formula (I), R1represents a hydrogen atom or a methyl group;
- L1represents a single bond or a bivalent connecting group;
- Ar1represents an aromatic connecting group;
- X1 represents a group leaving when acted on by an acid;
- and m is an integer of 1 to 3, and
- in general formula (III), R3 represents a hydrogen atom or a methyl group;
- L3 represents a single bond or a bivalent connecting group;
- Ar3 represents an aromatic connecting group;
- and n is an integer of 1 to 3,
- wherein at least one X1 in general formula (I) is a group represented by following general formula (B):
- in the formula,
- L1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or an aralkyl group,
- L2 represents a cycloalkyl group, an aryl group or an aralkyl group,
- M represents a single bond or a bivalent connecting group, and
- Q represents an alkyl group, a cycloalkyl group, a cycloaliphatic group, an aromatic ring group, an amino group, an ammonium group, a mercapto group, a cyano group or an aldehyde group, provided that each of the cycloaliphatic group and the aromatic ring group may contain a heteroatom.
16 more elements
Dependencies are inferred from the claim text.