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US 9,316,906 B2Granted
Fluorene oxime ester compound, photopolymerization initiator and photoresist composition containing the same
AssigneesKorea Research Institute of Chemical Technology, Samyang Corporation
InventorsSeung Rim Shin, Kun Jun, Jong Il Shin, Soo Youl Park, Kyoung Lyong An, Sang Oh Lee, Bong Seok Moon, Chunrim Oh, Anam Choi, In-Young So
Life of this patent
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Abstract
Provided are a novel fluorene oxime ester compound, and a photopolymerization initiator and a photoresist composition containing the same.
Claims8
A fluorene oxime ester compound represented by the following Chemical Formula 1:
- where,
- each R1 is independently (C1-C20)alkyl;
- R2 is hydrogen, halogen, (C1-C20)alkyl, (C6-C20)aryl, (C1-C20)alkoxy, (C6-C20)aryl(C1-C20)alkyl, hydroxy(C1-C20)alkyl, hydroxy(C1-C20)alkoxy(C1-C20)alkyl, or (C3-C20)cycloalkyl;
- R3 is (C1-C20)alkyl, (C6-C20)aryl, (C1-C20)alkoxy, (C6-C20)aryl(C1-C20)alkyl, hydroxy(C1-C20)alkyl, hydroxy(C1-C20)alkoxy(C1-C20)alkyl, or (C3-C20)cycloalkyl;
- and
- A is hydrogen, (C1-C20)alkyl, (C6-C20)aryl, (C1-C20)alkoxy, (C6-C20)aryl(C1-C20)alkyl, hydroxy(C1-C20)alkyl, hydroxy(C1-C20)alkoxy(C1-C20)alkyl, (C3-C10)cycloalkyl, amino, nitro, cyano, or hydroxyl.
3 more elements
Dependencies are inferred from the claim text.