Method of detecting foreign material on upper surface of transparent substrate using polarized light
AssigneeNanoprotech Co., Ltd.
InventorsYeong Ryeol Kim, Cheul Ock Chae, Jin Yong Kim, Sang Tae Kim
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AssigneeNanoprotech Co., Ltd.
InventorsYeong Ryeol Kim, Cheul Ock Chae, Jin Yong Kim, Sang Tae Kim
Estimating the term…
Provided are an apparatus and a method of detecting a foreign material capable of detecting only a foreign material on a surface of a substrate except for a foreign material on a lower surface of the substrate in a manufacturing process of a transparent substrate passing light therethrough, such as a glass substrate used in a flat panel display (FPD) such as a liquid crystal display (LCD), an organic light emitting diode (OLED), a plasma display panel (PDP), a sapphire wafer used in some of semiconductors, or the like, and in a pattern forming process in a manufacturing process of the FPD and the semiconductor using the transparent substrate.
A method of detecting a foreign material on an upper surface of a transparent substrate using polarized light comprising:
Dependencies are inferred from the claim text.