Method and system for measuring patterned substrates
AssigneeApplejack 199 L.P.
InventorArun Ananth Aiyer
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AssigneeApplejack 199 L.P.
InventorArun Ananth Aiyer
Estimating the term…
A system and method of measuring feature depth using a common path auto-correlation low coherence interferometer including a light source having an output directed toward a first beam splitter, the first beam splitter directing at least a portion of a light beam from the light source toward a sample having two reflective interfaces including a top surface reflective interface and a feature bottom reflective interface. The first beam splitter can also pass toward a second beam splitter each of a reference light beam reflected from the top surface interface and a measurement light beam reflected from the feature bottom reflective interface. The second beam splitter directs the reference light beam to a first mirror and the measurement light beam to a second mirror and combines a reflected measurement light beam from the second mirror and a reflected reference light beam from the first mirror to form an interference pattern.
A common path auto-correlation low coherence interferometer system comprising:
A common path auto-correlation low coherence interferometer method comprising:
Dependencies are inferred from the claim text.