Composition for forming resist underlayer film and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTsutomu Ogihara, Jun Hatakeyama
Life of this patent
Estimating the term…
Abstract
The invention provides a composition for forming a resist underlayer film including: as a component (A), a silicon-containing compound obtained by hydrolysis and/or condensation of one or more kinds of silicon compounds represented by the following general formula (A-1). There can be provided a composition for forming a resist underlayer film having etching selectivity relative to a conventional organic film and a silicon-containing film and favorable pattern adhesiveness relative to fine pattern even in a complicated patterning process. R1Aa1R2Aa2R3Aa3Si(OR0A)(4-a1-a2-a3) (A-1)
Claims14
A composition for forming a resist underlayer film, comprising:
- as a component (A), a silicon-containing compound obtained by hydrolysis and/or condensation of one or more kinds of silicon compounds represented by the following general formula (A-1), one or more kinds of silicon compounds represented by the following general formula (A-2), and one or more kinds of metallic compounds represented by the following general formula (A-3),
- R1Aa1R2Aa2R3Aa3Si(OR0A)(4-a1-a2-a3) (A-1)
- wherein, ROA represents a hydrocarbon group having 1 to 6 carbon atoms;
- any one or more of R1A, R2A and R3A represents an organic group having nitrogen atom, sulfur atom, phosphorus atom, or iodine atom, and the other(s) are a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms;
- and a1, a2 and a3 represent 0 or 1 and satisfy 1≦a1+a2+a3≦3,
- R5Aa5R6Aa6R7Aa7Si(OR4A)(4-a5-a6-a7) (A-2)
- wherein, R4A represents a hydrocarbon group having 1 to 6 carbon atoms;
- each of R5A, R6A and R7A represents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms;
- and a5, a6 and a7 represent 0 or 1 and satisfy 0≦a5+a6+a7≦3,
- L(OR8A)a8(OR9A)a9(O)a10 (A-3)
- wherein, R8A and R9A represent an organic group having 1 to 30 carbon atoms;
- a8, a9 and a10 represent an integer of 0 or more and a8+a9+2×a10 is the same number as the number determined by valency of L;
- and L is an element belonging to groups of III, IV, or V in a periodic table except for carbon and silicon, and
- as a component (B), a metal-containing compound obtained by hydrolysis and/or condensation of one or more kinds of metallic compounds represented by the following general formula (B-1),
- M(OR0B)b0(OR1B)b1(O)b2 (B-1)
- wherein, ROB and R1B represent an organic group having 1 to 10 carbon atoms, b0, b1 and b2 represent an integer of 0 or more and b0+b1+2×b2 is the same number as the number determined by a valency of M, and M is one selected from the group consisting of aluminum, germanium, titanium, zirconium and hafnium.
Dependencies are inferred from the claim text.