Junction-functionalized block copolymers
AssigneeThe Regents of the University of California
InventorsDamien Montarnal, Yingdong Luo, Craig J. Hawker, Edward J. Kramer, Glenn H. Frederickson
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Abstract
Junction-functionalized block copolymers can be used in forming nanostructures. A junction-functionalized block copolymer can include a first polymer block joined to a second polymer block by a junction, where the junction includes one or more electrostatically charged moieties. The block copolymer can include a moiety of formula (I): A-J-B (I) where A is a first polymer block, B is a second polymer block, where the A block and the B block are chemically dissimilar, and J is a junction linking the A block to the B block, and including one or more electrostatically charged moieties.
Claims18
A block copolymer comprising a moiety of formula (I):
- A-J-B (I)
- wherein
- A is a first polymer block;
- B is a second polymer block, wherein the A block and the B block are chemically dissimilar;
- and
- J is a junction linking the A block to the B block and including one or more electrostatically charged moieties.
A composite structure for forming a patterned substrate, comprising:
- a substrate;
- and
- a layer including a block copolymer material formed on at least a portion of a surface of said substrate,
- wherein said block copolymer material includes a moiety of formula (I):
- A-J-B (I)
- wherein
- A is a first polymer block;
- B is a second polymer block, wherein the A block and the B block are chemically dissimilar;
- and
- J is a junction linking the A block to the B block and including one or more electrostatically charged moieties;
- wherein said substrate becomes said patterned substrate after processing said composite structure.
A method for forming a patterned substrate comprising the steps of:
- (a) providing a substrate;
- (b) forming a layer including a block copolymer material on at least a portion of a surface of said substrate, wherein said block copolymer material includes a moiety of formula (I):
- A-J-B (I)
- wherein
- A is a first polymer block;
- B is a second polymer block, wherein the A block and the B block are chemically dissimilar;
- and
- J is a junction linking the A block to the B block and including one or more electrostatically charged moieties;
- (c) exposing the layer to an etching process, wherein the etching process exposes a pattern of regions of the substrate;
- and
- (d) exposing the pattern of regions of substrate material to a second etching process selected for its ability to etch the layer of substrate exposed by step (c).
Dependencies are inferred from the claim text.