Process for producing FePt-based sputtering target

A process for producing an FePt-based sputtering target, comprising:

• adding C powder containing unavoidable impurities and metal oxide powder containing unavoidable impurities to FePt-based alloy powder containing Pt in an amount of 40 at % or more and less than 60 at % and one or more kinds of metal elements other than Fe and Pt in an amount of more than 0 at % and 20 at % or less with the balance being Fe and unavoidable impurities and with a total amount of Pt and the one or more kinds of metal elements being 60 at % or less so that the C powder and the metal oxide powder are added to satisfy:
• 0<α≦20;
• 10≦β<40;
• and
• 20≦α+β≦40,
• where α and β represent contents of the C powder and the metal oxide powder by vol %, respectively, based on a total amount of the FePt-based alloy powder, the C powder, and the metal oxide powder, followed by mixing the FePt-based alloy powder, the C powder, and the metal oxide powder to produce a powder mixture;
• and
• molding the produced powder mixture while the powder mixture is heated under pressure.