Conductive structures for microfeature devices and methods for fabricating microfeature devices

A method for fabricating interposer devices having substrates, the method comprising:

• forming a plurality of conductive sections on a first side of a first interposer substrate in a first pattern;
• forming a plurality of conductive sections on a first side of a second interposer substrate in a second pattern different than the first pattern, wherein the second interposer substrate is separate and discrete from the first interposer substrate;
• and
• constructing a plurality of conductive lines on both the first interposer substrate and the second interposer substrate, wherein the first interposer substrate and the second interposer substrate have the same predetermined arrangement of conductive lines,
• wherein the plurality of conductive lines are formed either before or after forming the conductive sections in the first pattern and/or forming the conductive sections in the second pattern on the first and second interposer substrates, respectively,
• wherein the conductive lines at the first side of the first interposer substrate are positioned to be directly electrically coupled to corresponding connectors on a first microelectronic die to which the first interposer substrate will be attached, and
• wherein the conductive lines at the first side of the second interposer substrate are positioned to be directly electrically coupled to corresponding connectors on a second microelectronic die to which the second interposer substrate will be attached, wherein the first interposer substrate remains separate and discrete from the second interposer substrate before and after constructing the plurality of conductive lines.