Systems and methods for a wafer scale atomic clock
AssigneeHoneywell International Inc.
InventorsJeffrey James Kriz, James L. Tucker, Kenneth H. Heffner, Robert Compton
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Abstract
Systems and methods for a wafer scale atomic clock are provided. In at least one embodiment, a wafer scale device comprises a first substrate; a cell layer joined to the first substrate, the cell layer comprising a plurality of hermetically isolated cells, wherein separate measurements are produced for each cell in the plurality of hermetically isolated cells; and a second substrate joined to the cell layer, wherein the first substrate and the second substrate comprise electronics to control the separate measurements, wherein the separate measurements are combined into a single measurement.
Claims20
A wafer scale device, the wafer scale device comprising:
- a first substrate;
- a cell layer joined to the first substrate, the cell layer comprising a plurality of hermetically isolated cells, wherein separate measurements are produced for each cell in the plurality of hermetically isolated cells;
- and
- a second substrate joined to the cell layer opposite the first substrate, wherein the first substrate and the second substrate comprise electronics to control the separate measurements, wherein the separate measurements are combined into a single measurement.
A wafer scale atomic clock, the atomic clock comprising:
- an electronics layer;
- a light source layer joined to the electronics layer, wherein electronics in the electronics layer control the emission of light from at least one light source in the light source layer;
- a cell layer joined to the light source layer, the cell layer comprising a plurality of cells, wherein the at least one light source emits light into the separate cells in the plurality of cells;
- and
- a light control layer joined to the cell layer opposite the light source layer, wherein light within the plurality of cells is incident on the light control layer and the light control layer comprises electronics.
A method for fabricating a wafer scale device, the method comprising:
- fabricating a first substrate;
- fabricating a cell layer, wherein the cell layer comprises a plurality of cells;
- fabricating a second substrate;
- joining the cell layer to the first substrate such that the first substrate is able to provide separate measurements for each cell in the plurality of cells;
- and
- joining the second substrate to the cell layer opposite the first substrate, wherein the first substrate and the second substrate comprise electronics to control the separate measurements, wherein the separate measurements are averaged to form a single measurement.
Dependencies are inferred from the claim text.