High power filter with single adjust for multiple channels

A RF filter system for filtering radio frequency (RF) power transmitted from at least an electrostatic chuck (ESC) in a plasma processing system, said plasma processing system including at least a first load disposed at a first portion of said ESC, said plasma processing system further including at least a power supply, said RF filter system comprising:

• a first core member;
• a first plurality of capacitors, said first plurality of capacitors comprising at least a first capacitor and a second capacitor;
• a first conductor;
• a second conductor, wherein first portions of the first conductor and second conductor are wound around and wound along at least a first portion of said first core member to form at least a first set of inductors comprising a first inductor formed from the first conductor and a second inductor formed from the second conductor, a first end of said first conductor being connected to a first end of said first load and to a first end of said first capacitor and a second end of said first conductor being electrically connected to said power supply, wherein a first end of said second conductor being connected to a second end of said first load and a second end of said second capacitor, and wherein a second end of said second conductor being electrically connected to said power supply;
• and
• a first variable component with a first end connected to ground, and a second end connected to a second end of said first capacitor and a first end of said second capacitor.