Multilayer electronic structure with novel transmission lines
AssigneeZhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co. Ltd.
InventorDror Hurwitz
Life of this patent
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Abstract
A signal carrier for carrying a signal in a direction within the X-Y plane of a multilayer composite electronic structure comprising a plurality of dielectric layers extending in an X-Y plane, the signal carrier comprising a first transmission line comprising a lower continuous metallic layer and further comprising a row of metallic via posts coupled to the continuous metal layer, wherein the transmission line is separated by a dielectric material from an underlying reference plane.
Claims21
A method of fabricating a signal carrier for carrying a signal in a direction within an X-Y plane of a multilayer composite electronic structure comprising a plurality of dielectric layers extending in the X-Y plane, the signal carrier comprising a transmission line comprising a lower continuous metallic line and a metallic via line that comprises either a continuous via post or discrete via posts, the metallic via line stands on and are conductively coupled to the lower continuous metal line, wherein the transmission line is separated by a lower layer of the plurality of dielectric layers from an underlying continuous metal reference plane, comprising the steps of:
- (a) obtaining a substrate;
- depositing thereover the continuous metal reference plane;
- (b) covering the continuous metal reference plane with the lower layer of the plurality of dielectric layers;
- (c) fabricating the lower continuous metallic conducting line;
- (d) fabricating the metallic via line over the lower continuous metallic conducting line by pattern plating or by panel plating;
- (e) laminating a further dielectric layer of the plurality of dielectric layers over the metallic via line and the lower continuous metallic conducting line;
- (f) thinning the further dielectric layer to expose a top surface of the metallic via line;
- (g) depositing a top conducting line over the metallic via line, and
- (h) laminating an upper layer of the plurality of dielectric layers over the top conducting line.
Dependencies are inferred from the claim text.