Back to results
US 9,312,478 B2Granted
Magnetic devices and methods of manufacturing the same
AssigneeSamsung Electronics Co., Ltd.
InventorsHak-sun Lee, Tokashiki Ken, Myeong-cheol Kim, Hyung-joon Kwon, Sang-min Lee, Woo-cheol Lee, Myung-hoon Jung
Life of this patent
Estimating the term…
Abstract
Magnetic devices, and methods of manufacturing the same, include a stack structure including at least one magnetic layer, etched using an etching gas including at least 70 volume percent of a hydrogen-containing gas and at least 2 volume percent of CO gas.
Claims18
A method of manufacturing a magnetic device, the method comprising:
- etching a stack structure including at least one magnetic layer by using an etching gas including at least 70 volume percent of a hydrogen-containing gas and at least 2 volume percent of CO gas;
- wherein the hydrogen-containing gas includes at least one selected from CH4 gas, H2 gas and a combination thereof.
A method of manufacturing a magnetic device, comprising:
- forming a stack structure including at least one magnetic layer;
- and
- etching the at least one magnetic layer by exposing the at least one magnetic layer to an etching gas including at least 70 volume percent of a hydrogen-containing gas and at least 2 volume percent of CO gas:
- wherein the hydrogen-containing gas includes at least one selected from CH4 gas, H2 gas and a combination thereof.
1 more element
Dependencies are inferred from the claim text.