Semiconductor light device and manufacturing method for the same
AssigneeFurukawa Electric Co., Ltd.
InventorsHidehiro Taniguchi, Yutaka Ohki
Life of this patent
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Abstract
Provided is a semiconductor light device comprising a semiconductor substrate having a first conduction type; a first cladding layer having the first conduction type deposited above the semiconductor substrate; an active layer; a second cladding layer having a second conduction type; and a contact layer. The active layer includes a window portion that is disordered via diffusion of vacancies and a non-window portion having less disordering than the window portion, and the contact layer includes a first region and a second region that is below the first region and has greater affinity for hydrogen than the first region.
Claims8
A semiconductor light device, comprising:
- a semiconductor substrate having a first conduction type;
- a first cladding layer having the first conduction type and deposited above the semiconductor substrate;
- an active layer deposited above the first cladding layer;
- a second cladding layer having a second conduction type and deposited above the active layer;
- and
- a contact layer deposited on the second cladding layer,
- wherein
- the active layer includes
- a window portion that is disordered via diffusion of vacancies, and
- a non-window portion having less disordering than the window portion,
- the contact layer includes
- a first region, and
- a second region that is below the first region and has greater affinity for hydrogen than the first region,
- the second region has
- a first hydrogen concentration in a region corresponding to the non-window portion, and
- a second hydrogen concentration in a region corresponding to the window portion,
- the first hydrogen concentration is higher than the second hydrogen concentration, and
- the first hydrogen concentration in the region corresponding to the non-window portion is greater than 8.0E+16 atoms/cm3.
Dependencies are inferred from the claim text.