Thin film type solar cell and fabrication method thereof

A method of fabricating a solar cell, the method comprising:

• forming a doped portion having a first conductive type on a semiconductor substrate;
• growing an first oxide layer on the semiconductor substrate;
• forming a plurality of recess portions in the first oxide layer and the doped portion having the first conductivity type to expose the semiconductor substrate;
• growing a second oxide layer on the first oxide layer, on the sidewalls of the plurality of recess portions, and on the exposed semiconductor substrate inside the recess portions;
• removing a first portion of the second oxide layer to expose the semiconductor substrate while maintaining a second portion of the second oxide layer on the sidewalls of the plurality of recess portions;
• forming a doped portion having a second conductive type on areas of the semiconductor substrate corresponding to the recess portions inside the second portion of the second oxide layer on the sidewalls of the plurality of recess portions;
• forming a first conductive electrode electrically coupled to the doped portion having the first conductive type;
• and
• forming a second conductive electrode on the semiconductor substrate electrically coupled to the doped portion having the second conductive type,
• wherein a gap between the doped portions having the first and second conductive types corresponds to a width of the second portion of the second oxide layer formed on the sidewalls of the recessed portions.