Vertical cross point arrays for ultra high density memory applications
AssigneeUnity Semiconductor Corporation
InventorBruce Lynn Bateman
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AssigneeUnity Semiconductor Corporation
InventorBruce Lynn Bateman
Estimating the term…
An ultra-high-density vertical cross-point array comprises a plurality of horizontal line layers having horizontal lines interleaved with a plurality of vertical lines arranged in rows and columns. The vertical lines are interleaved with the horizontal lines such that a row of vertical lines is positioned between each consecutive pair of horizontal lines in each horizontal line layer. Each vertical line comprises a center conductor surrounded by a single or multi-layered memory film. Accordingly, when interleaved with the horizontal lines, two-terminal memory cells are integrally formed between the center conductor of each vertical line and each crossing horizontal line. By configuring the vertical and horizontal lines so that a row of vertical lines is positioned between each consecutive pair of horizontal lines, a unit memory cell footprint of just 2F2 may be realized.
A memory structure, comprising:
The memory structure of 10, wherein said select transistors or diodes comprise at least one of vertical field-effect transistors (FETs) or metal-insulator-metal (MIM) devices.
Dependencies are inferred from the claim text.