Method for manufacturing array substrate
AssigneeShenzhen China Star Optoelectronics Technology Co., Ltd.
InventorXiangyang Xu
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Abstract
A method for manufacturing an array substrate for producing an amorphous silicon (a-Si) array substrate of a low-definition OLED display is provided. The method includes: patterning a gate metal and a pixel electrode on a glass substrate by using a first mask which is a first half tone mask; patterning a gate insulation layer and a semiconductor layer on the glass substrate with a second mask which is a second half tone mask; forming source/drain metallic layers and a channel with a third mask; and forming a bank layer with a fourth mask. The a-Si array substrates of low-definition OLED display panels undertake less manufacturing processes, which means that mask plates are used less and cost is reduced.
Claims19
A method for manufacturing an array substrate for producing an amorphous silicon (a-Si) array substrate of a low-definition organic light emitting diode (OLED) display, comprising:
- patterning a gate metal and a pixel electrode on a glass substrate by using a first mask which is a first half tone mask;
- patterning a gate insulation layer and a semiconductor layer on the glass substrate with a second mask which is a second half tone mask;
- forming source/drain metallic layers and a channel with a third mask;
- and
- forming a bank layer with a fourth mask.
A method for manufacturing an array substrate for producing an amorphous silicon (a-Si) array substrate of a low-definition organic light emitting diode (OLED) display, comprising:
- patterning a gate metal and a pixel electrode on a glass substrate by using a first mask which is a first half tone mask;
- patterning a gate insulation layer and a semiconductor layer on the glass substrate with a second mask which is a second half tone mask;
- forming source/drain metallic layers and a channel with a third mask;
- and
- forming a bank layer with a fourth mask;
- wherein the step of patterning a gate metal and a pixel electrode on a glass substrate with a first mask which is a first half tone mask comprises:
- depositing a pixel electrode layer and a gate metallic layer on the glass substrate, and coating a first photoresist on the pixel electrode layer and the gate metallic layer;
- exposing and developing the first photoresist with the first half tone mask;
- wet-etching the gate metallic layer and the pixel electrode layer, and removing part of the first photoresist;
- wet-etching the gate metallic layer again and lifting off the first photoresist, to pattern the gate metal and the pixel electrode.
Dependencies are inferred from the claim text.