Charged particle beam apparatus
AssigneeHitachi High-Technologies Corporation
InventorsYasunari Sohda, Tasuku Yano, Muneyuki Fukuda, Noritsugu Takahashi, Hajime Kawano, Hiroyuki Ito
Life of this patent
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Abstract
In order to provide a charged particle beam apparatus enabling reduction of deflecting coma aberration in cases such as where wide field-of-view scanning is carried out, a charged particle beam apparatus is provided with an electromagnetic objective lens and a stage on which a sample is placed, wherein the electromagnetic objective lens is provided with the following: a plurality of magnetic paths; an objective lens coil; an opening disposed so as to face the sample; an inner lens deflector disposed more on the objective lens coil side than the end of the opening.
Claims11
A charged particle beam apparatus, comprising:
- a charged particle source;
- an upper stage deflector deflecting a charged particle beam emitted from the charged particle source;
- an electromagnetic objective lens irradiating the charged particle beam deflected by the upper stage deflector onto a sample;
- and
- a stage on which the sample is placed,
- wherein the electromagnetic objective lens has an upper magnetic path and a lower magnetic path and an objective lens coil surrounded by the upper magnetic path and the lower magnetic path, an aperture constituted by the upper magnetic path and the lower magnetic path and positioned to face the sample, and an in-lens deflector arranged between the objective lens coil and an end of the aperture.
A charged particle beam apparatus comprising:
- a charged particle source;
- an upper stage deflector;
- an electromagnetic objective lens;
- and
- a stage on which a sample is placed, all sequentially arranged along a travelling direction of a charged particle beam emitted from the charged particle source,
- wherein the electromagnetic objective lens has:
- an upper magnetic path and a lower magnetic path;
- an objective lens coil surrounded by the upper magnetic path and the lower magnetic path;
- an aperture constituted by the upper magnetic path and the lower magnetic path and arranged to face the sample, and
- an in-lens deflector including a toroidal coil and arranged between the objective lens coil and an end of the aperture.
Dependencies are inferred from the claim text.