Methods for reducing body effect and increasing junction breakdown voltage
AssigneeSanDisk Technologies LLC
InventorsChia-Lin Hsiung, Fumiaki Toyama, Masaaki Higashitani
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AssigneeSanDisk Technologies LLC
InventorsChia-Lin Hsiung, Fumiaki Toyama, Masaaki Higashitani
Estimating the term…
Methods for reducing an increase in the threshold voltage of a transistor due to the body effect and increasing the junction breakdown voltage for junctions of the transistor are described. The transistor may comprise an NMOS transistor that transfers a programming voltage (e.g., 24V) to a word line of a memory array during a programming operation. In some cases, a first poly shield may be positioned within a first distance of a gate of the transistor and may comprise a first polysilicon structure that is directly adjacent to the gate of the transistor. The first poly shield may be arranged in a first direction (e.g., in the channel length direction of the transistor). The first poly shield may be biased to a first voltage greater than ground (e.g., 10V) during the programming operation to reduce an increase in the threshold voltage of the transistor due to the body effect.
A method for operating a non-volatile storage system, comprising:
A non-volatile storage system, comprising:
A method for operating a non-volatile storage system, comprising:
Dependencies are inferred from the claim text.