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US 9,310,700 B2Granted
Lithography method and apparatus
AssigneeASML Netherlands B.V.
InventorsAdrianus Hendrik Koevoets, Michael Jozef Mathijs Renkens, Sander Frederik Wuister
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Abstract
In an embodiment, a lithography method is disclosed that includes providing a providing a first heat load to a first area of an object, and providing a second heat load to a second area of the object, wherein the second heat load is configured to ensure a deformation of the first area of the object caused by providing both the first heat load and the second heat load is smaller than a deformation of the first area of the object caused by providing only the first heat load.
Claims20
A lithography method comprising:
- providing a first heat load to a first area of an object;
- and
- providing a second heat load to a second area of the object, wherein the first and the second heat loads are provided simultaneously and are configured to provide different intensities using at least one beam of radiation,
- wherein the second heat load is configured to ensure a deformation of the first area of the object caused by providing both the first heat load and the second heat load is smaller than a deformation of the first area of the object caused by providing only the first heat load,
- wherein the object is a substrate, an imprint template, or a reticle.
2 more elements
A lithography apparatus comprising:
- a first heat output configured to provide a first heat load to a first area of an object;
- and
- a second heat output configured to provide a second heat load to a second area of the object;
- wherein the second heat output ensures a deformation of the first area of the object caused by providing both the first heat load and the second heat load is smaller than a deformation of the first area of the object caused by providing only the first heat load,
- wherein the first and the second heat loads are provided simultaneously and are configured to provide different intensities using at least one beam of radiation, wherein the object is a substrate, an imprint template, or a reticle.
2 more elements
Dependencies are inferred from the claim text.