Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus

An illumination system configured to illuminate an illumination field in an object plane, the illumination system comprising:

• a component configured to set a scan-integrated illumination energy in the object plane, the component comprising:
• a plurality of diaphragms, each diaphragm having a delimiting edge configured to delimit an illumination field in the object plane,
• wherein:
• the plurality of diaphragms includes a first diaphragm and a second diaphragm;
• the first and second diaphragms are arranged alongside one another;
• the first diaphragm has a delimiting edge having a shape that delimits an illumination field in the object plane;
• the second diaphragm has a delimiting edge having a shape that delimits the illumination field in the object plane;
• the shape of the delimiting edge of the first diaphragm differs from the shape of the delimiting edge of the second diaphragm;
• the delimiting edge is configured so that a scan-integrated illumination energy varies by less than 0.5% in a region of the illumination field in the object plane;
• and
• the illumination system is configured to be used in a microlithography projection exposure apparatus.

An illumination system configured to illuminate an illumination field having an arcuate form in an object plane, the illumination system comprising:

• a component configured to set a scan-integrated illumination energy in the object plane, the component comprising:
• a plurality of diaphragms, each diaphragm having a delimiting edge configured to delimit an illumination field in the object plane, the delimiting edge being in or near a plane, the plane being selected from the group consisting of the object plane and a plane that is optically conjugate to the object plane,
• wherein, for each diaphragm:
• there is a diaphragm region and an assigned influencing region in the object plane so that the scan-integrated illumination energy can be altered in the assigned influencing region of the illumination field via the diaphragm;
• and
• the delimiting edge is configured so that the scan-integrated illumination energy varies by less than 0.5% in the assigned influencing region.