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US 9,310,682 B2Granted
Positive-type resist composition
AssigneeCentral Glass Company, Limited
InventorsYoshiharu Terui, Takashi Mori, Haruhiko Komoriya
Life of this patent
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Abstract
A positive-type resist composition according to the present invention includes a fluorine-containing aliphatic alcohol, a polymer, a vinyl compound and a photoacid generator, wherein the fluorine-containing aliphatic alcohol is a monohydric C2-C8 aliphatic alcohol in which the number of hydrogen atoms is equal to or less than the number of fluorine atoms. This positive-type resist composition has a small influence on organic materials, such as less dissolution and swelling of the organic materials, and can form a resist film on an organic polymer substrate etc. by a wet application process such that the resulting resist film or resist pattern shows high solvent resistance.
Claims12
A positive-type resist composition comprising:
- a fluorine-containing monohydric C2-C8 aliphatic alcohol in which the number of hydrogen atoms is equal to or less than the number of fluorine atoms;
- a polymer having a repeating unit A of the following general formula (1)
- and a repeating unit B of the following general formula (2)
- a vinyl compound;
- and
- a photoacid generator,
- wherein, in the general formula (1), R1 represents a hydrogen atom, a fluorine atom, or a C1-C3 alkyl group in which a part or all of hydrogen atoms may be substituted with a fluorine atom or a chlorine atom;
- R2 represents any of the following groups:
- and
- L1 represents a single bond, an oxygen atom, —CH2—O—, —C(═O)—, —C(═O)—O— or —O—C(═O)—;
- and
- wherein, in the general formula (2), R3 represents a hydrogen atom, a fluorine atom, or a C1-C3 alkyl group in which a part or all of hydrogen atoms may be substituted with a fluorine atom or a chlorine atom;
- and
- D is a group of the following general formula (6)
- wherein R4 represents a C1-C8 alkyl group in which a part or all of hydrogen atoms may be substituted with a fluorine atom or a chlorine atom;
- L2 represents a single bond, an oxygen atom, —CH2—O—, —C(═O)—, —C(═O)—O— or —O—C(═O)—;
- R7 represents a C1-C15 straight, C3-C15 branched or C6-C15 cyclic hydrocarbon group in which a part or all of hydrogen atoms may be substituted with a fluorine atom or a chlorine atom;
- R8 represents a hydrogen atom, or a C1-C15 straight, C3-C15 branched or C6-C15 cyclic hydrocarbon group in which a part or all of hydrogen atoms may be substituted with a fluorine atom or a chlorine atom;
- R7 and R8 may be bonded together to form a ring structure;
- and
- L3 represents a single bond, or a C1-C15 straight or C3-C15 branched divalent hydrocarbon group in which a part of carbon atoms may be replaced by an oxygen atom and in which a part or all of hydrogen atoms may be substituted with a fluorine atom or a chlorine atom.
18 more elements
A positive-type resist composition, comprising:
- a fluorine-containing monohydric C2-C8 aliphatic alcohol in which the number of hydrogen atoms is equal to or less than the number of fluorine atoms;
- a polymer having a repeating unit A of the following general formula (1)
- and a repeating unit B of the following general formula (2)
- a vinyl compound;
- and
- a photoacid generator,
- wherein, in the general formula (1), R1 represents a hydrogen atom, a fluorine atom, or a C1-C3 alkyl group in which a part or all of hydrogen atoms may be substituted with a fluorine atom or a chlorine atom;
- R2 represents a C1-C15 straight or C3-C15 branched hydrocarbon group in which a part of carbon atoms may be replaced by an oxygen atom and in which a part or all of hydrogen atoms may be substituted with a fluorine atom or a chlorine atom;
- and
- L1 represents a single bond, an oxygen atom, —CH2—O—, —C(═O)—, —C(═O)—O— or —O—C(═O)—
- wherein, in the general formula (2), R3 represents a hydrogen atom, a fluorine atom, or a C1-C3 alkyl group in which a part or all of hydrogen atoms may be substituted with a fluorine atom or a chlorine atom;
- and
- D represents a group of the following general formula (6)
- wherein R4 represents a C1-C8 alkyl group in which a part or all of hydrogen atoms may be substituted with a fluorine atom or a chlorine atom;
- L2 represents a single bond, an oxygen atom, —CH2—O—, —C(═O)—, —C(═O)—O— or —O—C(═O)—;
- R7 represents a C1-C15 straight, C3-C15 branched or C6-C15 cyclic hydrocarbon group in which a part or all of hydrogen atoms may be substituted with a fluorine atom or a chlorine atom;
- R8 represents a hydrogen atom, or a C1-C15 straight, C3-C15 branched or C6-C15 cyclic hydrocarbon group in which a part or all of hydrogen atoms may be substituted with a fluorine atom or a chlorine atom;
- R7 and R8 may be bonded together to form a ring structure;
- and
- L3 represents a single bond, or a C1-C15 straight or C3-C15 branched divalent hydrocarbon group in which a part of carbon atoms may be replaced by an oxygen atom and in which a part or all of hydrogen atoms may be substituted with a fluorine atom or a chlorine atom.
17 more elements
Dependencies are inferred from the claim text.