Patterned retardation film for three-dimensional display and method for producing mold for patterned alignment film for three-dimensional display

A method for producing a mold for a patterned alignment film for three-dimensional display, comprising:

• a first layer preparation step of preparing a first layer composed of a metal material or an inorganic material;
• a first three-dimensional structure forming step of forming a first fine linear three-dimensional structure in a surface of the first layer in an approximately constant direction;
• a resist forming step of forming a resist in a parallel stripe pattern on the surface of the first layer after the first three-dimensional structure forming step;
• a second layer forming step of forming a second layer, composed of a metal material or an inorganic material, in a parallel stripe pattern on the surface of the first layer that remains exposed after the resist forming step;
• a protective layer forming step of forming a protective layer, composed of a resist material, on the surface of the first layer;
• a second three-dimensional structure forming step of forming a second fine linear three-dimensional structure in a surface of the second layer in an approximately constant direction which is different from or the same as the direction in which the first three-dimensional structure is formed;
• and
• a removing step of removing the protective layer.

A method for producing a mold for a patterned alignment film for three-dimensional display, comprising:

• a first layer forming step of forming a first layer composed of a metal;
• a first three-dimensional structure forming step of forming a fine linear three-dimensional structure in a surface of the first layer in an approximately constant direction;
• a resist forming step of forming a resist in a parallel stripe pattern on the surface of the first layer after the first three-dimensional structure forming step;
• a second layer forming step of forming a second layer, composed of an inorganic material, by performing dry plating of a surface of the resist and an exposed surface of the first layer after the resist forming step;
• a removing step of removing the resist;
• a protective layer forming step of forming a protective layer by performing wet plating of an exposed part of the first layer after the removing step;
• a second three-dimensional structure forming step of forming a fine linear three-dimensional structure in a surface of the second layer in an approximately constant direction which is different from or the same as that in the first three-dimensional structure forming step;
• and
• a removing step of removing the protective layer.

A method for producing a mold for a patterned alignment film for three-dimensional display, having an alternating stripe pattern of a first three-dimensional structure region where a fine linear three-dimensional structure is formed in an approximately constant direction and a second three-dimensional structure region where a fine linear three-dimensional structure is formed in an approximately constant direction different from that of the first three-dimensional structures, comprising:

• a first polishing step of forming the first three-dimensional structure region in a surface of a first layer composed of an inorganic material;
• a second layer forming step of forming-a resist portions in a stripe pattern on the surface of the first layer, and then forming a second-layer film, composed of an inorganic material, on the surfaces of the resist portions and the non-resist portions, thereby forming a patterned second layer on the non-resist portions;
• a second polishing step of forming the second three-dimensional structure region by polishing a surface of the second-layer film in a direction different from that in the first polishing step;
• and
• a resist removing step of removing the resist portions and the second-layer film on the resist portions.

A method for producing a mold for a patterned alignment film for three-dimensional display, comprising:

• an underlayer preparation step of preparing an underlayer composed of a metal material;
• a resist forming step of forming a resist in a parallel stripe pattern on a surface of the underlayer;
• a first layer forming step of forming a first layer-forming layer, composed of an inorganic material having insulating properties, by performing dry plating of the surfaces of the underlayer and the resist, and then removing a laminate of the resist and a part of the first layer-forming layer overlying the resist, thereby forming a first layer in a parallel stripe pattern;
• a first three-dimensional structure forming step of forming a first fine linear three-dimensional structure in a surface of the first layer in an approximately constant direction;
• a second layer forming step of forming a second layer, composed of a metal material and having a thickness which is equal to or larger than a thickness of the first layer, by performing wet plating of only an exposed surface of the underlayer after the first three-dimensional structure forming step;
• and
• a second three-dimensional structure forming step of forming a second fine linear three-dimensional structure in a surface of the second layer in an approximately constant direction different from the direction in which the first three-dimensional structure is formed.

A method for producing a mold for a patterned alignment film for three-dimensional display, comprising:

• an underlayer preparation step of preparing an underlayer composed of a metal material;
• a resist forming step of forming a resist in a parallel stripe pattern on a surface of the underlayer;
• a first layer forming step of forming a first layer-forming layer, composed of an inorganic material having insulating properties, by performing dry plating of the surfaces of the underlayer and the resist, and then removing a laminate of the resist and a part of the first layer-forming layer overlying the resist, thereby forming a first layer in a parallel stripe pattern;
• a first three-dimensional structure forming step of forming a first fine linear three-dimensional structure in a surface of the first layer in an approximately constant direction;
• a second layer forming step of forming a second layer, composed of a metal material and having a thickness which is larger than a thickness of the first layer, by performing wet plating of only an exposed surface of the underlayer after the first three-dimensional structure forming step;
• and
• a second three-dimensional structure forming step of forming a second fine linear three-dimensional structure in a surface of the second layer in an approximately constant direction which is the same as the direction in which the first three-dimensional structure is formed.

A patterned retardation film comprising:

• a transparent substrate film;
• a patterned alignment film, formed on one surface of the transparent substrate film, having a surface consisting of first alignment regions and second alignment regions, arranged alternately and each region having linear three-dimensional structure formed therein, with the linear three-dimensional structure of the second alignment regions being formed in a direction which is the same as or different from a direction in which the linear three-dimensional structure of the first alignment regions are formed;
• and
• a patterned retardation layer, formed on said surface of the patterned alignment film, containing a liquid crystal compound which is aligned by the linear three-dimensional structure of the first alignment regions and the linear three-dimensional structures of the second alignment regions,
• wherein the linear three-dimensional structure of the first alignment regions and the linear three-dimensional structure of the second alignment regions have a height of not less than 1 nm and not more than 500 nm, and have a pitch of not less than 1 nm and not more than 100 nm.