Focused ion beam apparatus and method of working sample using the same

A method of working a sample using a focused ion beam apparatus, the method comprising:

• generating a sample image including location detection marks formed on a sample, based on secondary charged particles generated from the sample by emission of a focused ion beam to the sample which is a working target;
• displaying the sample image;
• moving a sample stage on which the sample is placed;
• and
• in a case of performing working by emitting the focused ion beam to a working region of the sample that is beyond a display range of the displayed sample image,
• forming location detection marks on at least one of the sample and the sample image on the display unit;
• performing working of at least part of the working region of the sample by irradiating the sample with the ion beam on a first sample image while detecting a location of a first location detection mark formed at a processing starting point side and controlling an emission location of the focused ion beam based on the first location detection mark to correct a working location shift due to movement of the sample;
• detecting a location of any one of the location detection marks which is to be included in a second sample image after the movement of the sample stage as a reference mark, from the location detection marks included in the first sample image before the movement of the sample stage;
• switching the sample image from the first sample image which includes a processed working region to the second sample image which includes an unprocessed working region by moving the sample stage;
• performing working of the unprocessed working region by irradiating the sample with the ion beam on the second sample image while detecting a location of the reference mark in the sample image after the movement of the sample stage;
• and
• controlling an emission location of the focused ion beam based on the reference mark to correct a working location shift due to movement of the sample stage.

A non-transitory computer-readable medium having a computer program for focused ion beam working stored thereon and readable by a computer, the computer program, when executed by the computer, causes the computer to perform operations comprising:

• an image generation process of generating a sample image including location detection marks formed on a sample, based on secondary charged particles generated from the sample by emission of a focused ion beam to the sample which is a working target;
• displaying the sample image;
• moving a sample stage on which the sample is placed;
• and
• in a case of performing working by emitting the focused ion beam to a working region of the sample that is beyond a display range of the displayed sample image:
• forming location detection marks on at least one of the sample and the sample image on the display unit;
• performing working of at least part of the working region of the sample by irradiating the sample with the ion beam on a first sample image while detecting a location of a first location detection mark formed at a processing starting point side and controlling an emission location of the focused ion beam based on the first location detection mark to correct a working location shift due to movement of the sample;
• detecting a location of any one of the location detection marks, which is included in a second sample image after the movement of the sample stage as a reference mark, from the location detection marks included in the first sample image before the movement of the sample stage;
• performing working of the unprocessed working region by irradiating the sample with the ion beam on the second, sample image while detecting a location of the reference mark in the sample image after the movement of the sample stage;
• and
• controlling an emission location of the focused ion beam based on the reference mark to correct a working location shift due to movement of the sample stage.