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US 9,310,225 B2Granted
Scale for photoelectric encoder
AssigneeMitutoyo Corporation
InventorFujio Maeda
Life of this patent
Estimating the term…
Abstract
A scale for a photoelectric encoder includes a scale substrate and a reflection film formed at a predetermined pitch on the scale substrate. A surface of the reflection film forms a reflection surface. A low-reflection surface is formed by etching the scale substrate between reflection films. Accordingly, a scale can be provided which is lower in cost and has favorable yield rates.
Claims6
A scale for a photoelectric encoder comprising:
- a stainless steel scale substrate;
- a plurality of chrome reflection films each having a thickness of 25 nm to 200 nm and located on the substrate at a predetermined pitch, the plurality of reflection films comprising a reflection surface;
- and
- a low-reflection surface between reflection films of the plurality of reflection films and formed by etching the scale substrate.
1 more element
An encoder comprising:
- a stainless steel scale substrate;
- a scale arranged on the scale substrate, the scale comprising:
- a low-reflection surface in which the substrate is etched at a predetermined pitch and in an orthogonal direction on top of the scale substrate;
- and
- a light reflection surface having a chrome reflection film with a higher reflectance than the low-reflection surface formed in a region between where the low-reflection surfaces are formed and following a direction orthogonal to a measurement direction of the scale, the chrome reflection film having a thickness of 25 nm to 200 nm;
- and
- a reader configured to read the scale.
4 more elements
A method of forming a scale having a low-reflection surface and a light reflection surface, the method comprising:
- forming, on a polished surface of a stainless steel substrate, a chrome reflection film adhesive with a scale substrate and a higher reflectance than the low-reflection surface, the reflection film having a thickness of 25 nm to 200 nm;
- etching a portion of the reflection film at fixed intervals and in a direction orthogonal to a measurement direction of the scale to form the light reflection surface;
- and
- etching the reflection film, then further etching a region where a polished surface of the substrate is exposed to form the low-reflection surface.
1 more element
Dependencies are inferred from the claim text.