Surface shape measuring apparatus
AssigneeHitachi High-Technologies Corporation
InventorsMasaaki Ito, Takahiro Jingu, Hisashi Hatano
Life of this patent
Estimating the term…
Abstract
In related art, consideration is not given to that a spatial distribution of scattered light changes in various direction such as forward/backward/sideways according to a difference in micro roughness. Particularly, although a step-terrace structure appearing on an epitaxial growth wafer produces anisotropy in the scattered light distribution, consideration is not given to this point in the related art. The invention includes a process in which light is illuminated to a sample surface, plural detection optical systems mutually different in directions of optical axes detect a spatial distribution of scattered light, and a spatial frequency spectrum of the sample surface is calculated.
Claims13
A surface shape measuring apparatus for obtaining a surface shape of a sample, comprising:
- an illumination optical system to illuminate light to the sample, the illumination optical system including a light source and optics, the optics being configured to direct light from the light source to the sample;
- a plurality of detection optical systems to detect scattered light from the sample and to output a detection signal corresponding to the detected scattered light, each of the plurality optical systems including a detector and an AD convertor;
- a storage medium which stores a library;
- and
- a digital signal processing part which obtains a continuous spatial frequency spectrum of micro roughness of the sample by using detection signals of the plurality of detection optical systems and the library.
Dependencies are inferred from the claim text.