Crystallographically textured metal substrate, crystallographically textured device, cell and photovoltaic module including such device and thin layer deposition method

A crystallographically textured device comprising:

• a crystallographically textured metallic substrate comprising a connection surface and a surface intended to receive a thin layer deposit;
• a thin polycrystalline silicon-based layer deposited on said surface intended to receive a thin layer deposit, the thin polycrystalline silicon based layer having a crystallographic orientation (100) and (111),
• the crystallographically textured metallic substrate being made up of an alloy having a cubic crystalline system with centred faces and a predominantly cubic crystallographic texture (100) <001>, the surface intended to receive a thin layer deposit of the crystallographically textured metallic substrate including grains mainly presenting crystallographic planes (100) parallel to the surface intended to receive a thin layer deposit, and having a roughness of Ra less than 150 nm,
• wherein the alloy is an iron-nickel alloy that comprises, as a % of weight relative to the total weight of the alloy:
• Ni ≧30%,
• Cu ≦15%,
• Cr ≦15%,
• Co ≦12%,
• Mn ≦5%,
• S <0.0007%,
• P <0.003%,
• B <0.0005%,
• Pb <0.0001%,
• the percentages in nickel, chromium, copper, cobalt and manganese are such that the alloy satisfies the following condition:
• 34%≦(Ni+Cr+Cu/2+Co/2+Mn)≦54%,
• up to 1% of at least one deoxidizing element elected from the group consisting of silicon, magnesium, aluminium and calcium,
• the balance being iron and impurities, wherein the impurities ≦1% , and
• the average expansion coefficient of the alloy, α20100, between 20° C. and 100° C., being greater than 10−6 K−1.