US 9,308,552 B2 · Curable composition and method of forming pattern

Abstract

A curable composition that can be released from a mold simply within a short period of time after photo-curing by a small mold-releasing force is provided. The curable composition contains a gas-generating agent that generates a gas by pressure application. A method of forming a pattern is also provided. In the method, the mold can be released with a small force.

Drawings

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Drawings

Claims3

Dependent claims

A method of forming a pattern to provide a cured product provided with the pattern on a substrate to be processed, the method comprising:

arranging a curable composition on a substrate to be processed;
bringing a mold having a contact surface provided with a depression pattern into contact with the curable composition on the substrate to be processed;
curing the curable composition by irradiating the curable composition being in contact with the mold with heat or light;
generating a gas by applying a pressure to the curable composition being in contact with the mold;
and
releasing the mold and the curable composition from each other,
wherein the curable composition comprises a polymerizable monomer, a polymerization initiator, and a gas-generating agent that generates a gas by pressure application, wherein
the polymerization initiator initiates polymerization of the polymerizable monomer;
and
the curable composition cures by polymerization of the polymerizable monomer.

7 more elements

Dependencies are inferred from the claim text.

Description6,474 words

Summary708 words

#1. Field of the Invention

#The present invention relates to a novel curable composition and a method of forming a pattern, specifically, a method of forming a pattern by photo-nanoimprint.

#2. Description of the Related Art

Brief description of the drawings1 figure

#FIGS. 1A to 1G are diagrams schematically illustrating each step of a method of forming a pattern.

Detailed description5,749 words

#A curable composition according to an embodiment includes a polymerizable monomer (A), a polymerization initiator (B), and also a gas-generating agent (C).

#Though a photo-curable composition that cures by light irradiation will be described in detail in the embodiment, the curable composition of the present invention may be one that polymerizes by stimulation other than light, such as a heat-curable composition that cures by heat application.

#The components (A), (B), and (C) will now be described.

Facts

Application

13/682,464Filed 20 Nov 2012

Priority

JP 2011-25927128 Nov 2011

Published

US 2013/0136901 A130 May 2013

Granted

12 Apr 2016

Term ends

1 Mar 2034

Estimated · how

20 years from earliest known nonprovisional domestic filing plus recorded patent term adjustment, including 466 days of adjustment. Maintenance-fee lapses, terminal disclaimers and statutory extensions have not been checked. The continuity chain may be incomplete; this is not an enforceability determination.

Classification9 codes

B05D 5/00
Processes for applying liquids or other fluent materials to surfaces to obtain
B82Y 10/00
Nanotechnology for information processing, storage or transmission
B82Y 40/00
Manufacture or treatment of nanostructures
G03F 7/0002
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g.…

Timeline

28 Nov 2011Priority claimedJP 2011-259271
20 Nov 2012Application filedUS 13/682,464
28 Mar 2013Assigned to Canon Kabushiki Kaishaassignment of assignor's interest
30 May 2013PublishedUS 2013/0136901 A1
12 Apr 2016GrantedUS 9,308,552 B2
12 Oct 2026TodayWithin its term
1 Mar 2034Term endsEstimated, includes 466 days of adjustment

Curable composition and method of forming pattern

Life of this patent

Curable composition and method of forming pattern

Life of this patent

Life of this patent

Abstract

Drawings

Drawings

Claims3

Description6,474 words

Classification9 codes

Life of this patent

Description6,474 words

Drawings