Fabricating self-formed nanometer pore array at wafer scale for DNA sequencing
AssigneeGlobalfoundries Inc.
InventorsGustavo A. Stolovitzky, Deqiang Wang
Life of this patent
Estimating the term…
Abstract
A technique is provided for a structure. A substrate has a nanopillar vertically positioned on the substrate. A bottom layer is formed beneath the substrate. A top layer is formed on top of the substrate and on top of the nanopillar, and a cover layer covers the top layer and the nanopillar. A window is formed through the bottom layer and formed through the substrate, and the window ends at the top layer. A nanopore is formed through the top layer by removing the cover layer and the nanopillar.
Claims14
A method of forming a structure, the method comprising:
- providing a substrate having a nanopillar vertically positioned on the substrate, wherein a bottom layer is formed beneath the substrate;
- providing a top layer formed on top of the substrate and on top of the nanopillar, wherein a cover layer covers the top layer and the nanopillar;
- forming a window through the bottom layer and through the substrate, wherein the window ends at the top layer;
- and
- forming a nanopore through the top layer by removing all of the cover layer and the nanopillar, such that none of the cover layer remains on the top layer.
A method of forming a structure, the method comprising:
- providing a substrate having a nanopillar vertically positioned on the substrate, wherein a bottom layer formed beneath the substrate;
- providing a plurality of top layers formed on top of the substrate and on top of the nanopillar, wherein a cover layer covers the plurality of top layers and the nanopillar;
- forming a window through the bottom layer and formed through the substrate, wherein the window ends at the plurality of top layers;
- and
- forming a nanopore through the plurality of top layers by removing all of the cover layer and the nanopillar, such that none of the cover layer remains on the plurality of top layers.
A method of forming a structure, the method comprising:
- providing a substrate having a top layer and a bottom layer;
- forming a hole through the top layer, wherein the hole is coated with a coating to capture a carbon nanotube in the hole, the carbon nanotube being captured to be positioned in the hole;
- forming a window through the bottom layer and through the substrate, wherein the window ends at the top layer;
- forming a cover layer that covers the top layer and the carbon nanotube positioned in the hole, wherein the cover layer is not formed in the hole of the top layer;
- and
- forming a nanopore through the cover layer by removing the carbon nanotube from the cover layer.
Dependencies are inferred from the claim text.