Apparatus and techniques for energetic neutral beam processing

A method of processing a substrate with a neutral beam, comprising:

• generating a plasma within a plasma source chamber, the plasma containing ions of a desired species to form the neutral beam;
• extracting the ions from the plasma at an ion beam trajectory angle that forms a non-zero angle with respect to a perpendicular to a plane of the substrate, wherein the ion beam trajectory angle is adjustable by moving a beam modifier, disposed adjacent an extraction plate, in a direction parallel to a plane defined by the extraction plate;
• providing a neutralizer having one or more neutralizer plates arranged at a neutralizer plate angle different than the first ion beam trajectory angle;
• forming a beam of neutrals by adjusting an ion beam incident angle between the neutralizer plate angle and the ion beam trajectory angle;
• and
• directing the beam of neutrals at the substrate at one or more neutral incidence angles with respect to the perpendicular to the plane of the substrate.

An apparatus for generating one or more angled neutral beams, comprising:

• a plasma source chamber configured to generate a plasma containing ions to form the angled neutral beam;
• an extraction plate electrically isolated from and adjacent to the plasma source chamber, the extraction plate having one or more apertures configured to extract the ions from the plasma;
• a set of beam modifiers adjacent the extraction plate and configured to vary an ion beam trajectory angle of ions extracted through the extraction plate, the set of beam modifiers disposed within the plasma source chamber between the plasma and the extraction plate;
• and
• a neutralizer adjacent to the extraction plate and configured to:
• receive the ions extracted through the extraction plate;
• reflect the received ions as neutrals;
• and
• direct the reflected ions as one or more neutral beams to the substrate at one or more angles with respect to a perpendicular to the substrate.