Liquid crystal display and manufacturing method thereof

A liquid crystal display comprising:

• a first substrate;
• a gate line and a data line disposed on the first substrate;
• a thin film transistor connected to the gate line and the data line;
• a first passivation layer disposed on the thin film transistor;
• a first electrode disposed on the first passivation layer;
• a second passivation layer disposed on the first electrode;
• and
• a second electrode disposed on the second passivation layer,
• wherein the first passivation layer comprises a first drain contact hole exposing a drain electrode of the thin film transistor, the first electrode comprises a second drain contact hole exposing the drain electrode, and the second passivation layer comprises a third drain contact hole exposing the drain electrode,
• the first drain contact hole, the second drain contact hole, and the third drain contact hole overlap with each other, and
• a size of the second drain contact hole is greater than a size of the third drain contact hole.

A method for manufacturing a liquid crystal display, comprising:

• forming a gate line, a data line, and a thin film transistor connected to the gate line and the data line on a first substrate;
• forming a first passivation layer including a first drain contact hole that exposes a drain electrode of the thin film transistor on the thin film transistor;
• forming a first electrode including a second drain contact hole exposing the drain electrode and a second passivation layer including a third drain contact hole exposing the drain electrode together on the first passivation layer through one photolithography process;
• forming a second electrode on the second passivation layer;
• forming the first drain contact hole, the second drain contact hole, and the third drain contact hole to be overlapped with each other;
• and
• forming a size of the second drain contact hole to be greater than a size of the third drain contact hole.