Back to results
US 9,287,150 B2Granted
Reticle transfer system and method
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorChing-Jung Chang
Life of this patent
Estimating the term…
Abstract
A fabrication system comprises a global system comprising a plurality of stockers and a global transportation system connected to the stockers, a local system coupled to the global system through the global transportation system, wherein the local system comprises a first buffer located at a boundary between the global system and the local system, a plurality of lithography apparatuses coupled to the first buffer through a local transportation system and an empty pod buffer.
Claims17
A fabrication system comprising:
- a global system comprising a plurality of stockers and a global transportation system connected to the stockers;
- a local system coupled to the global system through the global transportation system, wherein the local system comprises:
- a first buffer located at a boundary between the global system and the local system;
- a plurality of lithography apparatuses coupled to the first buffer through a local transportation system;
- an aisle, wherein a first terminal of the aisle is connected to the first buffer;
- a first rail coupled between the first buffer and a first group of lithography apparatuses;
- a second rail coupled between the first buffer and a second group of lithography apparatuses, wherein the first group of lithography apparatuses and the second group of lithography apparatuses are on opposite sides of the aisle;
- a second buffer connected to a second terminal of the aisle;
- an internal buffer located between the first buffer and the second buffer, wherein the internal buffer is adjustable;
- and
- an empty pod buffer.
8 more elements
A system comprising:
- a plurality of stockers configured to store reticles, wherein the stockers are located in a first region comprising:
- a first transportation system configured to move the reticles between different stockers;
- a plurality of lithography apparatuses in a second region, wherein the second region is connected to the first transportation system through a first buffer;
- a second transportation system in the second region, wherein the second transportation system is connected to the first buffer and the plurality of lithography apparatuses, wherein the second transportation system comprises:
- a first service area configured to serve a first group of lithography apparatuses;
- a second service area configured to serve a second group of lithography apparatuses;
- and
- an internal buffer located a boundary between the first service area and the second service area;
- an aisle, wherein a first terminal of the aisle is connected to the first buffer;
- a first rail coupled between the first buffer and a first group of lithography apparatuses;
- a second rail coupled between the first buffer and a second group of lithography apparatuses, wherein the first group of lithography apparatuses and the second group of lithography apparatuses are on opposite sides of the aisle;
- a second buffer connected to a second terminal of the aisle;
- and
- an empty pod buffer.
11 more elements
A system comprising:
- a global system comprising a main aisle, a plurality of stockers placed along the main aisle and a global transportation system connected to the plurality of stockers;
- and
- a local system connected to the global system through the global transportation system, wherein the local system comprises:
- a first buffer located at a boundary between the global system and the local system;
- a local transportation system having a first terminal connected to the first buffer;
- a plurality of lithography apparatuses connected to the local transportation system;
- a second buffer connected to a second terminal of the local transportation system;
- and
- a local aisle in the local system, wherein the lithography apparatuses include a first group placed on a first side of the local aisle and a second group placed on a second side of the local aisle, and wherein the local transportation system includes a first rail and a second rail in parallel, and wherein the first rail provides transportation for the first group and the second rail provides transportation for the second group.
6 more elements
Dependencies are inferred from the claim text.