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US 9,287,133 B2Granted
Hard mask removal scheme
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYing-Hsueh Changchien, Yu-Ming Lee, Chi-Ming Yang
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Abstract
A method for hard mask layer removal includes dispensing a chemical on a hard mask layer, in which the chemical includes an acidic chemical. The chemical is drained from a chamber after hard mask removal.
Claims20
A method for hard mask layer removal, the method comprising:
- dispensing a chemical on a hard mask layer, wherein the chemical comprises an acidic chemical;
- and
- draining the chemical from a chamber,
- wherein the chemical drained from the chamber is not recycled for hard mask removal.
1 more element
A method for fabricating a semiconductor device, the method comprising:
- providing a wafer comprising a hard mask layer;
- dispensing an acidic chemical on the hard mask layer for removing the hard mask layer;
- and
- draining the acidic chemical from a chamber,
- wherein the chemical drained from the chamber is not recycled for hard mask removal.
2 more elements
Dependencies are inferred from the claim text.