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US 9,287,095 B2Granted
Semiconductor system assemblies and methods of operation
AssigneeApplied Materials, Inc.
InventorsAndrew Nguyen, Kartik Ramaswamy, Srinivas Nemani, Bradley Howard, Yogananda Sarode Vishwanath
Life of this patent
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Abstract
An exemplary semiconductor processing system may include a remote plasma source coupled with a processing chamber having a top plate. An inlet assembly may be used to couple the remote plasma source with the top plate and may include a mounting assembly, which in embodiments may include at least two components. The inlet assembly may further include a precursor distribution assembly defining a plurality of distribution channels fluidly coupled with an injection port.
Claims17
A semiconductor processing system comprising:
- a remote plasma source;
- a processing chamber having a top plate having a first surface, and defining a recess within the first surface;
- and
- an inlet assembly coupling the remote plasma source with the top plate and comprising:
- a precursor distribution assembly defining a plurality of distribution channels fluidly coupled with an injection port, and
- a mounting assembly comprising:
- a gas block coupled between the remote plasma source and the precursor distribution assembly, and
- a mounting block coupled between the precursor distribution assembly and the top plate, wherein the mounting block extends past the first surface of the top plate to couple with the top plate within the recess.
5 more elements
A semiconductor processing system comprising:
- a remote plasma source;
- a processing chamber having a top plate;
- an inlet assembly coupling the remote plasma source with the top plate and comprising:
- a precursor distribution assembly defining a plurality of distribution channels fluidly coupled with a single injection port, wherein the precursor distribution assembly comprises at least two annular plates coupled with each other and at least partially defining a central distribution channel, wherein a first plate of the at least two annular plates defines the single injection port and a first distribution channel tangentially extending from the single injection port, and wherein a second plate of the at least two annular plates defines at least two secondary distribution channels in fluid communication with the first distribution channel and the central distribution channel, and
- a mounting assembly, wherein the mounting assembly comprises at least two components spatially separated by the precursor distribution assembly, wherein the at least two components include a first component positioned between and contacting each of the remote plasma source and the precursor distribution assembly, and a second component positioned between and contacting each of the precursor distribution assembly and the top plate;
- and
- a support assembly coupled with the remote plasma source and including at least one support extension extending from the support assembly towards the top plate, wherein the at least one support extension is separated from the top plate in a first operational position, and wherein the at least one support extension is configured to contact the top plate in a second operational position engageable during a processing operation.
4 more elements
A semiconductor processing system comprising:
- a remote plasma source;
- a processing chamber having a top plate defining at least a portion of a central distribution channel extending from the remote plasma source, wherein the central distribution channel extends past a first surface of the top plate and is fluidly coupled with a plurality of outlet distribution channels defined within the top plate;
- and
- an inlet assembly coupling the remote plasma source with the top plate and comprising:
- a precursor distribution assembly defining a portion of the central distribution channel and a plurality of internal channels fluidly coupled with an injection port,
- an annular gas block coupled between the remote plasma source and the precursor distribution assembly, wherein the annular gas block defines at least a portion of the central distribution channel, and
- a mounting block coupled between the precursor distribution assembly and the top plate, wherein the mounting block defines at least a portion of the central distribution channel.
4 more elements
Dependencies are inferred from the claim text.