Multi charged particle beam writing apparatus, and multi charged particle beam writing method

A multi charged particle beam writing apparatus comprising:

• a divided shot data generation unit configured to generate, for each shot of multi beams of charged particle beams, data for a plurality of times of divided shots such that irradiation for one shot of each beam is divided into the plurality of times of divided shots each having a different irradiation time;
• an individual blanking system configured to provide blanking control individually for the each beam of the multi beams, based on the data for the plurality of times of divided shots;
• an elastic rate correction value acquisition unit configured to acquire, for each divided shot of the plurality of times of divided shots, a correction value for correcting a position deviation of a writing pattern, depending upon a number of ON beams of the multi beams;
• and
• a lens configured to correct, for the each divided shot, the position deviation of the writing pattern by using the correction value.