Lithography system, modulation device and method of manufacturing a fiber fixation substrate

A charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target using a plurality of charged particle beamlets, the system comprising:

• a beam generator for generating a plurality of charged particle beamlets;
• a beamlet blanker array for patterning the plurality of beamlets in accordance with a pattern;
• and
• a projection system for projecting the patterned beamlets onto the target surface;
• wherein the beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements, a light sensitive element being arranged to receive pattern data carrying light beams and to convert the light beams into electrical signals, the light sensitive element being electrically connected to one or more modulators for providing the received pattern data to the one or more modulators;
• wherein the beamlet blanker array is coupled to a fiber fixation substrate which accommodates end sections of a plurality of fibers for providing the pattern data carrying light beams as an assembled group with a fixed connection,
• wherein the fiber fixation substrate comprises a substrate provided with a plurality of apertures through which the end sections of fibers extend, wherein the end sections of fibers are connected to the substrate with an adhesive, and
• wherein a surface of the fiber fixation substrate faces a surface of the beamlet blanker array, and the apertures on the fiber fixation substrate are aligned with the light sensitive elements on the beamlet blanker array.