Scanner based optical proximity correction system and method of use
AssigneesNikon Corporation, Nikon Precision Inc.
InventorsJacek Tyminski, Raluca Popescu, Tomoyuki Matsuyama
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Abstract
A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether δ1<ε1, wherein δ1 represents model vs. exposure difference and ε1 represents predetermined criteria. The technique further includes completing the model when δ1<ε1.
Claims23
A modeling method, comprising:
- inputting tool parameters into a model;
- inputting basic model parameters into the model;
- generating a simulated, corrected reticle design using the tool parameters and the basic model parameters;
- comparing an image of test patterns for an integrated circuit against the simulated, corrected reticle design;
- determining whether a difference between the simulated, corrected reticle design and exposure results of the image of the test patterns is less than a predetermined criteria;
- completing the model when the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria;
- and
- outputting information about variation of image to the tool parameters in order to determine which tool parameters are to be used in the model.
A system for setting a model, comprising:
- a computer infrastructure operable to:
- generate a simulated, corrected reticle design using inputted tool parameters and inputted basic model parameters;
- compare an image of test patterns for an integrated circuit against the simulated, corrected reticle design;
- determine whether a difference between the simulated, corrected reticle design and exposure results of the image of the test patterns is less than a predetermined criteria;
- complete a model when the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria;
- and
- output information about variation of image to the tool parameters in order to determine which tool parameters are to be used in the model.
A computer program product comprising a computer-readable storage medium having readable program code embodied in the computer-readable storage medium, the computer program product includes at least one component to:
- generate a simulated, corrected reticle design using inputted tool parameters and inputted basic model parameters;
- compare an image of test patterns for an integrated circuit against the simulated, corrected reticle design;
- determine whether a difference between the simulated, corrected reticle design and exposure results of the image of the test patterns is less than a predetermined criteria;
- complete a model when the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria;
- and
- output information about validation of image to the tool parameters in order to determine which tool parameters are to be used in the model.
Dependencies are inferred from the claim text.