Mirror, lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsVadim Yevgenyevich Banine, Leonid Aizikovitch Sjmaenok, Andrei Mikhailovich Yakunin
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Abstract
Embodiments of the invention relate to a mirror (30). The mirror includes a mirroring surface and a profiled coating layer (32a) having an outer surface, wherein one or more wedged elements are formed by the outer surface with respect to the mirroring surface, and wherein the one or more wedged elements having a wedge angle (ø) in a range of approximately 10-200 mrad. The profiled coating layer may have a curved outer surface. The profiled coating layer may be formed from at least one of the following materials: Be, B, C, P, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Ru, Nb, Mo, Ba, La, Ce, Pr, Pa and U.
Claims13
A mirror having a mirroring surface comprising:
- a single profiled coating layer having an outer surface provided with two wedged elements formed with respect to the mirroring surface,
- wherein the two wedged elements have a wedge angle in a range of about 10-200 mrad and the two wedged elements are located next to each other and are symmetric with respect to a symmetry axis between them, and
- wherein extreme ultraviolet (EUV) radiation of a radiation beam is transmitted through the profiled coating layer, while other wavelengths of the radiation beam are reflected at the outer surface of the two wedged elements.
A lithographic projection apparatus comprising:
- a radiation system configured to supply a projection beam of EUV radiation and a further radiation,
- wherein the radiation system comprises a mirror having a mirroring surface comprising a single profiled coating layer having an outer surface provided with two wedged elements formed with respect to the mirroring surface, wherein the two wedged elements have a wedge angle in a range of about 10-200 mrad and the two wedged elements are located next to each other and are symmetric with respect to a symmetry axis between them, and wherein the EUV radiation is transmitted through the profiled coating layer, while other wavelengths of the projection beam are reflected at the outer surface of the two wedged elements.
A device manufacturing method comprising:
- supplying a projection beam of EUV radiation and other wavelengths of radiation using a radiation system comprising a mirror having a mirroring surface comprising a single profiled coating layer having an outer surface provided with two wedged elements formed with respect to the mirroring surface, wherein the two elements have a wedge angle in a range of about 10-200 mrad and the two wedged elements are located next to each other and are symmetric with respect to a symmetry axis between them, and wherein the EUV radiation is transmitted through the profiled coating layer, while the other wavelengths are reflected at the outer surface of the two wedged elements;
- patterning the EUV radiation;
- and
- projecting the patterned beam onto a target portion of a layer of radiation-sensitive material.
Dependencies are inferred from the claim text.