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US 9,285,674 B2Granted
Apparatus and method for indirect surface cleaning
AssigneeRave, LLC
InventorsJeffrey E. LeClaire, Kenneth G. Roessler, David Brinkley
Life of this patent
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AssigneeRave, LLC
InventorsJeffrey E. LeClaire, Kenneth G. Roessler, David Brinkley
Estimating the term…
A photomask includes at least one feature disposed thereon. The at least one feature has an associated design location, where a distance between a location of the at least one feature and the associated design location defines a positional error of the at least one feature. A method for improving a performance characteristic of the photomask includes directing electromagnetic radiation toward the photomask, the electromagnetic radiation having a wavelength that substantially coincides with a high absorption coefficient of the photomask; generating a thermal energy increase in the photomask through incidence of the electromagnetic radiation thereon; and decreasing the positional error as a result of the generating the thermal energy increase in the photomask.
A method for improving a performance characteristic of a photomask, the photomask having at least one feature disposed thereon, the at least one feature having an associated design location, a distance between a location of the at least one feature and the associated design location defining a positional error of the at least one feature, the method comprising:
A method for improving optical characteristics of a photomask, comprising:
A method for improving optical characteristics of a photomask, comprising:
Dependencies are inferred from the claim text.