Reflective mask and method for manufacturing same
AssigneeToppan Printing Co., Ltd.
InventorsNorihito Fukugami, Yo Sakata, Kazuaki Matsui, Genta Watanabe
Life of this patent
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Abstract
A reflective mask having a light-shielding frame with high light-shielding performance, and a method for manufacturing thereof. In a reflective mask having a light-shielding frame dug into a multilayered reflective layer, when side etching is performed or processing to obtain a reverse tapered shape is performed only on the multilayered reflective layer, it becomes possible to suppress reflection of EUV light (extreme ultraviolet light) in the vicinity of the edge of the light-shielding frame, provide a reflective mask having high light-shielding ability, and form a transcription pattern with high accuracy.
Claims19
A reflective mask comprising:
- a substrate;
- a multilayered reflective layer formed on one surface of the substrate;
- a protective layer formed on the multilayered reflective layer;
- and
- an absorption layer formed on the protective layer, wherein
- at least one part of an outer side of a circuit pattern area formed on the absorption layer has a light-shielding frame that is formed through stripping of the absorption layer, the protective layer, and the multilayered reflective layer, and an opening width of the multilayered reflective layer within the light-shielding frame is wider than an opening width of the absorption layer located above thereof.
A method for manufacturing a reflective mask, the method comprising:
- forming a multilayered reflective layer on one surface of a substrate;
- forming an absorption layer on the multilayered reflective layer;
- forming a circuit pattern on the multilayered reflective layer;
- and
- forming a light-shielding frame through stripping, with dry etching or wet etching, of the multilayered reflective layer and the absorption layer in a frame-shaped area on an outer side of the circuit pattern, until one surface of the substrate is exposed, such that an opening width of the multilayered reflective layer is wider than an opening width of the absorption layer located above thereof.
Dependencies are inferred from the claim text.