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US 9,283,773 B2Granted
Plasma processing device and image forming apparatus including the same
AssigneeRicoh Company, Ltd.
InventorAkira Saito
Life of this patent
Estimating the term…
Abstract
A plasma processing device in an image forming apparatus includes: a first electrode; a second electrode which is disposed opposing to the first electrode to form a discharge space, has a hollow inside, and has both ends open; and a partition wall disposed at the side opposite to the first electrode with respect to the second electrode for forming a first wind tunnel in combination with a subject to be processed, when the subject to be processed is present in the discharge space, the first wind tunnel restricting a flow of a first cooling medium.
Claims8
A plasma processing device comprising:
- a first electrode;
- a second electrode which is disposed opposing to the first electrode to form a discharge space, has a hollow inside, and has both ends open;
- and
- a partition wall disposed at the side opposite to the first electrode with respect to the second electrode forming a first wind tunnel in combination with a substrate to be processed, when the substrate to be processed is present in the discharge space, the first wind tunnel restricting a flow of a first cooling medium.
1 more element
An image forming apparatus comprising:
- a plasma processing device;
- and
- an ink jet recording device that forms an image onto a substrate to be processed that has already undergone a plasma process with the plasma processing device, using an ink jet recording system, wherein the plasma processing device includes a first electrode, a second electrode which is disposed opposing to the first electrode to form a discharge space, has a hollow inside, and has both ends open, and
- a partition wall disposed at the side opposite to the first electrode with respect to the second electrode forming a first wind tunnel in combination with the substrate to be processed, when the substrate to be processed is present in the discharge space, the first wind tunnel restricting a flow of a first cooling medium.
1 more element
Dependencies are inferred from the claim text.