Position detection apparatus, imprint apparatus, and position detection method

An imprint apparatus for transferring a pattern formed on a mold to an imprint material supplied to a substrate, the apparatus comprising a detection apparatus configured to detect light diffracted by diffraction gratings formed on the mold and the substrate,

• wherein the detection apparatus comprises
• an illumination optical system configured to illuminate a fifth diffraction grating having periods in each of a second direction and a third direction different from the second direction and a first direction perpendicular to the second direction, and a second diffraction grating having a period different from the period in the second direction of the fifth diffraction grating in the second direction, at an oblique incidence, and illuminate a sixth diffraction grating having periods in each of the third direction and the first direction, and a fourth diffraction grating having a period different from the period in the first direction of the sixth diffraction grating in the first direction, at an oblique incidence;
• and
• a detection optical system configured to detect diffracted light from the fifth diffraction grating and the second diffraction grating, and diffracted light from the sixth diffraction grating and the fourth diffraction grating,
• wherein the illumination optical system includes a first pole and a second pole which is in opposite side of the first pole with respect to an optical axis on a pupil plane thereof,
• wherein the detection optical system detects the light diffracted by the fifth diffraction grating and the second diffraction grating by illuminating the fifth diffraction grating and the second diffraction grating with the light from the first pole and the second pole at an oblique incidence in the third direction radiated from the illumination optical system, and
• wherein the detection optical system detects the light diffracted by the sixth diffraction grating and the fourth diffraction grating by illuminating the sixth diffraction grating and the fourth diffraction grating with the light from the first pole and the second pole at an oblique incidence in the third direction radiated from the illumination optical system.

An imprint apparatus for transferring a pattern formed on a mold to an imprint material supplied to a substrate, the apparatus comprising a detection apparatus configured to detect light diffracted by diffraction gratings formed on the mold and the substrate,

• wherein the detection apparatus comprises
• an illumination optical system configured to illuminate a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period in a second direction different from the period of the first diffraction grating in the second direction, at an oblique incidence, and illuminate a third diffraction grating having periods in each of the first direction and the second direction, and a fourth diffraction grating having a period different from the period of the third diffraction grating in the first direction, at an oblique incidence;
• and
• a detection optical system configured to detect diffracted light from the first diffraction grating and the second diffraction grating, and diffracted light from the third diffraction grating and the fourth diffraction grating,
• wherein the illumination optical system includes a first pole and a third pole on a pupil plane thereof,
• wherein the detection optical system detects the light diffracted by the first diffraction grating and the second diffraction grating by illuminating the first diffraction grating and the second diffraction grating with the light from the first pole at an oblique incidence in the first direction radiated from the illumination optical system, and
• wherein the detection optical system detects the light diffracted by the third diffraction grating and the fourth diffraction grating by illuminating the third diffraction grating and the fourth diffraction grating with the light from the third pole at an oblique incidence in the second direction radiated from the illumination optical system.

A device manufacturing method, comprising:

• forming a pattern on a substrate using an imprint apparatus;
• and
• machining the substrate on which the pattern is formed,
• wherein the imprint apparatus is configured to transfer a pattern formed on a mold to an imprint material supplied to the substrate,
• wherein the imprint apparatus comprises a detection apparatus configured to detect light diffracted by diffraction gratings formed on the mold and the substrate,
• wherein the detection apparatus comprises
• an illumination optical system configured to illuminate a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period different from the period in the second direction of the first diffraction grating in the second direction, at an oblique incidence;
• and
• a detection optical system configured to detect diffracted light from the first diffraction grating and the second diffraction grating,
• wherein the illumination optical system includes a first pole and a second pole which is in opposite side of the first pole with respect to an optical axis on a pupil plane thereof, and
• wherein the detection optical system detects the light diffracted by the first diffraction grating and the second diffraction grating by illuminating the first diffraction grating and the second diffraction grating with the light from the first pole and the second pole at an oblique incidence in the first direction radiated from the illumination optical system.

A device manufacturing method, comprising:

• forming a pattern on a substrate using an imprint apparatus;
• and
• machining the substrate on which the pattern is formed,
• wherein the imprint apparatus is configured to transfer a pattern formed on a mold to an imprint material supplied to the substrate,
• wherein the imprint apparatus comprises a detection apparatus configured to detect light diffracted by diffraction gratings formed on the mold and the substrate,
• wherein the detection apparatus comprises
• an illumination optical system configured to illuminate a fifth diffraction grating having periods in each of a second direction and a third direction different from the second direction and a first direction perpendicular to the second direction, and a second diffraction grating having a period different from the period in the second direction of the fifth diffraction grating in the second direction, at an oblique incidence, and illuminate a sixth diffraction grating having periods in each of the third direction and the first direction, and a fourth diffraction grating having a period different from the period in the first direction of the sixth diffraction grating in the first direction, at an oblique incidence;
• and
• a detection optical system configured to detect diffracted light from the fifth diffraction grating and the second diffraction grating, and diffracted light from the sixth diffraction grating and the fourth diffraction grating,
• wherein the illumination optical system includes a first pole and a second pole which is in opposite side of the first pole with respect to an optical axis on a pupil plane thereof,
• wherein the detection optical system detects the light diffracted by the fifth diffraction grating and the second diffraction grating by illuminating the fifth diffraction grating and the second diffraction grating with the light from the first pole and the second pole at an oblique incidence in the third direction radiated from the illumination optical system, and
• wherein the detection optical system detects the light diffracted by the sixth diffraction grating and the fourth diffraction grating by illuminating the sixth diffraction grating and the fourth diffraction grating with the light from the first pole and the second pole at an oblique incidence in the third direction radiated from the illumination optical system.

A device manufacturing method, comprising:

• forming a pattern on a substrate using an imprint apparatus;
• and
• machining the substrate on which the pattern is formed,
• wherein the imprint apparatus is configured to transfer a pattern formed on a mold to an imprint material supplied to the substrate,
• wherein the imprint apparatus comprises a detection apparatus configured to detect light diffracted by diffraction gratings formed on the mold and the substrate,
• wherein the detection apparatus comprises
• an illumination optical system configured to illuminate a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period in a second direction different from the period of the first diffraction grating in the second direction, at an oblique incidence, and illuminate a third diffraction grating having periods in each of the first direction and the second direction, and a fourth diffraction grating having a period different from the period of the third diffraction grating in the first direction, at an oblique incidence;
• and
• a detection optical system configured to detect diffracted light from the first diffraction grating and the second diffraction grating, and diffracted light from the third diffraction grating and the fourth diffraction grating,
• wherein the illumination optical system includes a first pole and a third pole on a pupil plane thereof,
• wherein the detection optical system detects the light diffracted by the first diffraction grating and the second diffraction grating by illuminating the first diffraction grating and the second diffraction grating with the light from the first pole at an oblique incidence in the first direction radiated from the illumination optical system, and
• wherein the detection optical system detects the light diffracted by the third diffraction grating and the fourth diffraction grating by illuminating the third diffraction grating and the fourth diffraction grating with the light from the third pole at an oblique incidence in the second direction radiated from the illumination optical system.