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US 9,283,648 B2Granted
Methods of polishing sapphire surfaces
AssigneeEcolab USA Inc.
InventorsKim Marie Long, Michael Kamrath, Sean McCue
Life of this patent
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Abstract
Described herein are methods for polishing sapphire surfaces using compositions comprising colloidal silica, wherein the colloidal silica has a broad particle size distribution.
Claims18
A method of polishing a sapphire surface, comprising:
- abrading a sapphire surface with a rotating polishing pad and a polishing composition, wherein the polishing composition comprises an effective amount of colloidal silica, wherein the colloidal silica has a broad particle size distribution, and wherein the ratio of the standard deviation of the particle size of the colloidal silica (σ), to the mean particle size of the colloidal silica (r), is at least about 0.3.
A method of polishing a sapphire surface, comprising:
- abrading a sapphire surface with a rotating polishing pad and a polishing composition, wherein the polishing composition comprises an effective amount of colloidal silica, wherein the colloidal silica has a broad particle size distribution, and wherein the colloidal silica is prepared by a process comprising blending two or more colloidal silica compositions, wherein the colloidal silica compositions have an average particle size of about 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 88, 89, 90, 91, 92, 93, 94, 95, 96, 97, 98, 99, 100, 101, 102, 103, 104, 105, 106, 107, 108, 109, 110, 111, 112, 113, 114, 115, 116, 117, 118, 119, or 120 nm.
Dependencies are inferred from the claim text.