US 9,244,345 B1 · Non-ionic photo-acid generating polymers for resist applications

Abstract

Photo-acid generating vinyl polymerizable monomers (PAG monomers) were prepared comprising sulfonate ester groups of N-hydroxide imides. The photo-acid generating portion of the PAG monomer is linked to a polymerizable portion of the monomer by an amide linking group. Photo-acid generating polymers (PAG polymers) of the PAG monomers show high sensitivity to extreme ultraviolet radiation (13.5 nm) and much less sensitivity to far ultraviolet wavelengths (193 nm, 248 nm). The PAG polymers also exhibit thermal and chemical amplification properties useful for forming high resolution positive tone or negative tone lithographic resist patterns.

Claims37

Dependent claims

A compound of formula (1):

wherein
R′ is a monovalent radical selected from the group consisting of H, F, C1-C3 alkyl groups, fluorine-containing C1-C3 alkyl groups, and cyano,
L′ and L″ are independently divalent radicals comprising 1 to 10 carbons,
a carbon of L″ is linked to the carbonyl,
*—SO3—R″ represents a sulfonate ester of an N-hydroxy imide,
the compound is capable of polymerization, and
the compound is capable of generating an acid upon exposure to radiation.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application

14/534,824Filed 6 Nov 2014

Granted

26 Jan 2016

Term ends

Not estimatedThe source records don’t support an estimate.

Classification20 codes

C07D 221/14
Ring systems of three rings: aza-phenalenes, e.g. 1,8-naphthalimide
C07C 309/65
Having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms: of a saturated carbon skeleton
C07C 309/73
Having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton: to carbon atoms of…
C08F 220/52
Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof: amides or imides

Non-ionic photo-acid generating polymers for resist applications

Life of this patent

Non-ionic photo-acid generating polymers for resist applications

Life of this patent

Abstract

Claims37